Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area  for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discuss...

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Bibliographic Details
Call Number:Libro Electrónico
Corporate Author: SpringerLink (Online service)
Other Authors: Hwang, Cheol Seong (Editor)
Format: Electronic eBook
Language:Inglés
Published: New York, NY : Springer US : Imprint: Springer, 2014.
Edition:1st ed. 2014.
Subjects:
Electrochemistry.
Semiconductors.
Computer storage devices.
Memory management (Computer science).
Electric power production.
Electronics.
Computer Memory Structure.
Electrical Power Engineering.
Mechanical Power Engineering.
Electronics and Microelectronics, Instrumentation.
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