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Design for Manufacturability and Yield for Nano-Scale CMOS
As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...
| Call Number: | Libro Electrónico |
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| Main Authors: | , |
| Corporate Author: | |
| Format: | Electronic eBook |
| Language: | Inglés |
| Published: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2007.
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| Edition: | 1st ed. 2007. |
| Series: | Integrated Circuits and Systems,
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| Subjects: | |
| Online Access: | Texto Completo |