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|a (OCoLC)232159935
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|a MdBmJHUP
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|a Sassower, Raphael.
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|a Technoscientific Angst :
|b Ethics And Responsibility
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|a Minneapolis :
|b University of Minnesota Press,
|c 1997.
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|a Baltimore, Md. :
|b Project MUSE,
|c 2015
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|c ©1997.
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|a 1 online resource (160 pages).
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|a text
|b txt
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|a Preface; 1 Responsible Technoscience: The Haunting Reality of Auschwitz and Hiroshima; 2 Public Expectations of Technoscience: From Truth to Immortality; 3 Ambiguity and Anxiety: The Making of Human Anguish; 4 The Postmodern Option: A Dialectical Critique; 5 Responsible Technoscience: A Reconstruction; 6 The Price of Responsibility: From Personal to Financial; 7 Cultural Changes: Agenda Setting; References; Index.
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|a Reassesses the social and ethical situations of technoscientists. What responsibility do the Manhattan Project scientists have for the atomic devastation of Hiroshima? The Krupps scientists for the crematoriums at Auschwitz? Disturbing questions like these are at the heart of this book, a sobering exploration of scientific and intellectual responsibility. Raphael Sassower considers two related phenomena: the positive public image of science as the citadel of truth and objectivity and the angst displayed by scientists over their indirect roles in technological horrors. Largely unexamined, these c.
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|a Description based on print version record.
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|a Technology
|x Philosophy.
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|0 (OCoLC)fst01145171
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|a Technology
|x Moral and ethical aspects.
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|0 (OCoLC)fst01145164
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|a Science
|x Philosophy.
|2 fast
|0 (OCoLC)fst01108336
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|a Science
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|2 fast
|0 (OCoLC)fst01108321
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|a Sciences
|x Aspect moral.
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|a Technologie
|x Aspect moral.
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|a Technologie
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|a Science
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|a Science
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|a Technology
|x Moral and ethical aspects.
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|a Technology
|x Philosophy.
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|a Electronic books.
|2 local
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|a Project Muse.
|e distributor
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|a Book collections on Project MUSE.
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|z Texto completo
|u https://projectmuse.uam.elogim.com/book/32453/
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|a Project MUSE - Custom Collection
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|a Project MUSE - Archive Complete Supplement III
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|a Project MUSE - Archive Philosophy and Religion Supplement III
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