Cargando…
CMOS past, present and future /
Annotation
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Duxford :
Woodhead Publishing,
2018.
|
| Colección: | Woodhead Publishing series in electronic and optical materials.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000Mi 4500 | ||
|---|---|---|---|
| 001 | SCIDIR_on1030910731 | ||
| 003 | OCoLC | ||
| 005 | 20231120010251.0 | ||
| 006 | m o d | ||
| 007 | cr |n||||||||| | ||
| 008 | 180409s2018 enk o 001 0 eng d | ||
| 040 | |a YDX |b eng |e pn |c YDX |d OPELS |d NLE |d OCLCF |d STF |d N$T |d MERER |d OCLCQ |d D6H |d OCLCQ |d INT |d OCLCQ |d U3W |d LVT |d OCLCQ |d LQU |d UKAHL |d S2H |d OCLCO |d UX1 |d OCLCO |d OCLCQ |d SFB |d OCLCQ |d OCLCO | ||
| 019 | |a 1030967079 |a 1031663980 |a 1105173462 |a 1105566535 |a 1151735431 |a 1229752573 | ||
| 020 | |a 9780081021408 |q (electronic bk.) | ||
| 020 | |a 0081021402 |q (electronic bk.) | ||
| 020 | |z 0081021399 | ||
| 020 | |z 9780081021392 | ||
| 035 | |a (OCoLC)1030910731 |z (OCoLC)1030967079 |z (OCoLC)1031663980 |z (OCoLC)1105173462 |z (OCoLC)1105566535 |z (OCoLC)1151735431 |z (OCoLC)1229752573 | ||
| 050 | 4 | |a TK7871.99.M44 | |
| 072 | 7 | |a SCI |x 021000 |2 bisacsh | |
| 072 | 7 | |a SCI |x 022000 |2 bisacsh | |
| 082 | 0 | 4 | |a 537.6/223 |2 23 |
| 245 | 0 | 0 | |a CMOS past, present and future / |c Henry H. Radamson [and others]. |
| 260 | |a Duxford : |b Woodhead Publishing, |c 2018. | ||
| 300 | |a 1 online resource. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Woodhead Publishing series in electronic and optical materials | |
| 500 | |a Includes index. | ||
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a 1. Brief introduction CMOS applications in our daily life; 2. Basic definitions and equations; 3. Electrical measurements (IV, short channel effects, mobility and noise); 4. CMOS Architecture; 5. Strain engineering (stressor materials in source/drain regions, strain induced by processing, stress liners); 6. High-k and metal gate (Almost all known high-k materials and metal gates); 7. Channel materials (Ge, GeSn, SiGe, Graphene and other II-D crystals, III-V compounds); 8. Contacts (Silicide formation, contact resistance, parasitic contacts); 9. Integration with photonic components (CMOS with lasers, detectors); 10. Technology roadmap (starting from 50's to unknown future); 11. Authors' final words. | |
| 520 | 8 | |a Annotation |b 'CMOS Past, Present and Future' provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterisation, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. | |
| 650 | 0 | |a Metal oxide semiconductors, Complementary. | |
| 650 | 6 | |a MOS compl�ementaires. |0 (CaQQLa)201-0047869 | |
| 650 | 7 | |a SCIENCE |x Physics |x Electricity. |2 bisacsh | |
| 650 | 7 | |a SCIENCE |x Physics |x Electromagnetism. |2 bisacsh | |
| 650 | 7 | |a Metal oxide semiconductors, Complementary |2 fast |0 (OCoLC)fst01017635 | |
| 700 | 1 | |a Radamson, Henry H. | |
| 776 | 0 | 8 | |i Print version: |z 0081021399 |z 9780081021392 |w (OCoLC)1001545172 |
| 830 | 0 | |a Woodhead Publishing series in electronic and optical materials. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780081021392 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780081021392 |z Texto completo |