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Handbook of silicon wafer cleaning technology /

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal as...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Reinhardt, Karen A. (Editor ), Kern, Werner, 1925- (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Cambridge, MA : William Andrew, [2018]
Edición:Third edition.
Colección:Materials science and process technology series.
Temas:
Acceso en línea:Texto completo