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SCIDIR_ocn892737572 |
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20231120111809.0 |
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cr cnu---unuuu |
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141010s1973 nyua ob 001 0 eng d |
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|a OPELS
|b eng
|e rda
|e pn
|c OPELS
|d N$T
|d E7B
|d OCLCF
|d OCLCQ
|d UKAHL
|d VLY
|d OCLCQ
|d OCLCO
|d OCLCQ
|d OCLCO
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|a 1162286375
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|a 9781483103310
|q (electronic bk.)
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|a 1483103315
|q (electronic bk.)
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|z 9780125330077
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|a (OCoLC)892737572
|z (OCoLC)1162286375
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|a QC176.83
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072 |
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|a SCI
|x 024000
|2 bisacsh
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072 |
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|a SCI
|x 041000
|2 bisacsh
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|a SCI
|x 055000
|2 bisacsh
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|a 530.4/175
|2 22
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|a Physics of thin films.
|n Volume 7 :
|b advances in research and development /
|c edited by Georg Hass, Maurice H. Francombe, Richard W. Hoffman.
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264 |
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|a New York :
|b Academic Press,
|c 1973.
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300 |
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|a 1 online resource (xiv, 421 pages) :
|b illustrations
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336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Includes index.
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|a Print version record.
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|a Includes bibliographical references at the end of each chapters and indexes.
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|a Front Cover; Physics of Thin Films: Advances in Research and Development; Copyright Page; Table of Contents; CONTRIBUTORS TO VOLUME 7; CONTENTS OF PREVIOUS VOLUMES; PREFACE; ARTICLES PLANNED FOR FUTURE VOLUMES; Chapter 1. Electron Diffraction Analysis of the Local Atomic Order in Amorphous Films; I. Introduction; II. Diffraction Theory; III. Experimental Techniques; IV. Review of rdf Measurements; References; Chapter 2. The Preparation and Use of Unbacked Metal Films as Filters in the Extreme Ultraviolet; I. Introduction; II. General Considerations; III. Preparation of Films
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|a IV. Film Support and Filter FabricationV. Aging, Storage, and Cleaning of Filters; VI. Use of Unbacked Filters in Laboratory and Space Applications; References; Chapter 3. Properties and Applications of III-V Compound Films Deposited by Liquid Phase Epitaxy; I. Introduction; II. General Considerations; III. Properties of Binary Compounds; IV. Ternary Systems; V. Electroluminescent Diodes; VI. Microwave Devices; VII. Negative Electron Affinity Devices; VIII. Miscellaneous Devices; References; Chapter 4. Electromigration in Thin Films; I. Introduction; II. Lattice Effects
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|a III. Degradation in Thin FilmsIV. Alloying Effects; References; Chapter 5. Built-Up Molecular Films and Their Applications; I. Introduction; II. Insoluble Monolayers and Their Characteristics; III. Transfer of Monolayers on Solids: Building Up of Multilayers; IV. Structural Properties of Built-Up Molecular Films; V. Optical Properties of Films; VI. Electrical Properties of Films; VII. Applications of Built-Up Molecular Films; VIII. Future Potential of Films; References; AUTHOR INDEX; SUBJECT INDEX
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|a Physics of Thin Films: Advances in Research and Development, Volume 7 is a collection of papers about film growth and structure, optical properties, and semiconducting films. The book covers topics such as diffraction theory; film support and filter fabrication; aging, usage, and cleaning of filters; and properties and applications of III-V compound films. It also discusses topics such as the preparation of use and unbacked metal filters; electromigration in thin films; and the built-up molecular films and their applications. The text is recommended for physicists and engineers involved in thi.
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546 |
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|a English.
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650 |
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|a Thin films.
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650 |
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6 |
|a Couches minces.
|0 (CaQQLa)201-0035883
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650 |
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7 |
|a SCIENCE
|x Energy.
|2 bisacsh
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650 |
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7 |
|a SCIENCE
|x Mechanics
|x General.
|2 bisacsh
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650 |
|
7 |
|a SCIENCE
|x Physics
|x General.
|2 bisacsh
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650 |
|
7 |
|a Thin films
|2 fast
|0 (OCoLC)fst01150018
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700 |
1 |
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|a Hass, Georg,
|e editor.
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700 |
1 |
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|a Francombe, Maurice H.,
|e editor.
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700 |
1 |
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|a Hoffman, Richard Wagner,
|e editor.
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776 |
0 |
8 |
|i Print version:
|t Physics of thin films : Vol. 7: 1973
|z 0125330073
|w (OCoLC)643075922
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780125330077
|z Texto completo
|