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SCIDIR_ocn892737527 |
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OCoLC |
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20231120111809.0 |
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m o d |
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cr cnu---unuuu |
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141010s1994 caua ob 101 0 eng d |
040 |
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|a OPELS
|b eng
|e rda
|e pn
|c OPELS
|d UIU
|d YDXCP
|d IDEBK
|d EBLCP
|d OCLCQ
|d DEBSZ
|d MERUC
|d OCLCQ
|d OCLCO
|d OCLCQ
|d VLY
|d LUN
|d OCLCQ
|d COM
|d OCLCO
|d OCL
|d OCLCQ
|d OCLCO
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|a 926092572
|a 929529998
|a 1162386972
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|a 9780080925134
|q (electronic bk.)
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|a 0080925138
|q (electronic bk.)
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|z 9780125330183
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|z 0125330189
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035 |
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|a (OCoLC)892737527
|z (OCoLC)926092572
|z (OCoLC)929529998
|z (OCoLC)1162386972
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|a QC176.83
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|a 530.4/175
|2 23
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|a 33.80
|2 bcl
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|a UP 7550
|2 rvk
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|a UP 1100
|2 rvk
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0 |
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|a Plasma sources for thin film deposition and etching /
|c edited by Maurice H. Francombe, John L. Vossen.
|
264 |
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1 |
|a San Diego, CA. :
|b Academic Press,
|c 1994.
|
300 |
|
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|a 1 online resource (xiii, 397 pages) :
|b illustrations
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336 |
|
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|a text
|b txt
|2 rdacontent
|
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|a computer
|b c
|2 rdamedia
|
338 |
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|a online resource
|b cr
|2 rdacarrier
|
490 |
1 |
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|a Physics of thin films ;
|v volume 18
|
504 |
|
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|a Includes bibliographical references and indexes.
|
588 |
0 |
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|a Print version record.
|
546 |
|
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|a English.
|
650 |
|
0 |
|a Thin films.
|
650 |
|
6 |
|a Couches minces.
|0 (CaQQLa)201-0035883
|
650 |
|
7 |
|a Thin films
|2 fast
|0 (OCoLC)fst01150018
|
650 |
|
7 |
|a D�unne Schicht
|2 gnd
|0 (DE-588)4136925-7
|
650 |
|
7 |
|a Herstellung
|2 gnd
|0 (DE-588)4159653-5
|
650 |
|
7 |
|a Plasmaanlage
|2 gnd
|0 (DE-588)4139324-7
|
650 |
|
7 |
|a �Atzen
|2 gnd
|0 (DE-588)4000648-7
|
650 |
|
7 |
|a Couches minces.
|2 ram
|
650 |
|
7 |
|a Projection au plasma.
|2 ram
|
650 |
|
7 |
|a Technique des plasmas.
|2 ram
|
655 |
|
2 |
|a Congress
|0 (DNLM)D016423
|
655 |
|
7 |
|a proceedings (reports)
|2 aat
|0 (CStmoGRI)aatgf300027316
|
655 |
|
7 |
|a Conference papers and proceedings
|2 fast
|0 (OCoLC)fst01423772
|
655 |
|
7 |
|a Conference papers and proceedings.
|2 lcgft
|
655 |
|
7 |
|a Actes de congr�es.
|2 rvmgf
|0 (CaQQLa)RVMGF-000001049
|
700 |
1 |
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|a Francombe, Maurice H.,
|e editor.
|
700 |
1 |
|
|a Vossen, John L.,
|e editor.
|
776 |
0 |
8 |
|i Print version:
|t Plasma sources for thin film deposition and etching
|z 0125330189
|w (DLC) 63016561
|w (OCoLC)31414635
|
830 |
|
0 |
|a Physics of thin films ;
|v volume 18.
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780080925134
|z Texto completo
|