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20231120111809.0 |
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m o d |
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cr cnu---unuuu |
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141010s1969 nyua o 000 0 eng d |
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|a OPELS
|b eng
|e rda
|e pn
|c OPELS
|d E7B
|d N$T
|d EBLCP
|d YDXCP
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|d DEBSZ
|d OCLCQ
|d IDB
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|a 895430743
|a 915158545
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|a 9781483214702
|q (electronic bk.)
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|a 1483214702
|q (electronic bk.)
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|z 9780120029013
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|a (OCoLC)892737256
|z (OCoLC)895430743
|z (OCoLC)915158545
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|a TK7871.85
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|a TEC
|x 009070
|2 bisacsh
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|a 621.38152
|2 23
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|a Applied solid state science.
|n Volume 1 :
|b advances in materials and device research /
|c [edited by Raymond Wolfe].
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264 |
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|a New York :
|b Academic Press,
|c 1969.
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|a 1 online resource :
|b illustrations
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Print version record.
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|a Front Cover; Applied Solid State Science: Advances in Materials and Device Research; Copyright Page; List of Contributors; Table of Contents; PREFACE; ARTICLES PLANNED FOR FUTURE VOLUMES; Chapter 1. Junction Electroluminescence; I. Introduction; II. Energy-Band Description of Electron States in Crystalline Solids; III. Injection Mechanisms for Electroluminescence in p-n Homojunctions; IV. Electroluminescence Injection Processes Involving Heterojunctions; V. Energy Transport and Carrier Capture Mechanisms in Electroluminescent Devices.
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|a VI. Excitation Processes Most Suited to the Identification of Recombination Mechanisms in SemiconductorsVII. Radiative and Competing Nonradiative Carrier Recombination Mechanisms in Semiconductors; VIII. Coherent Stimulated Emission (Laser Action) in Semiconductors; IX. ""State of the Art"" Efficiencies of Electroluminescent Devices; X. Future Prospects; XI. Appendix: A Brief Survey of Very Recent Work; References; Chapter 2. Metal-Insulator-Semiconductor (MIS) Physics; I. Introduction; II. Ideal Metal-Insulator-Semiconductor Diode; III. Surface States.
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|a IV. Surface-State Measurement TechniquesV. Charges in the Insulator and Their Effect on the Semiconductor Surface; VI. Effects of Metal Work-Function Differences, Crystal Orientation, Temperature, Illumination, and Irradiation on MIS Characteristics; VII. Surface Varactor, Avalanche, Tunneling, and Electroluminescence in MIS Diodes; VIII. Carrier Transport in Insulating Films; References; Chapter 3. Ion Implantation in Semiconductors; I. Introduction; II. Ion Range Distributions; III. Lattice Disorder; IV. Lattice Location of Implanted Atoms; V. Electrical Characteristics.
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|a VI. Application of Ion Implantation to Device FabricationReferences; Chapter 4. Electron Transport through Insulating Thin Films; I. Introduction; II. Theory: Barrier-Limited Mechanisms; III. Theory: Bulk Conduction Phenomena; IV. Experimental Results: Comparison with Theory; References; AUTHOR INDEX; SUBJECT INDEX.
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|a Applied Solid State Science: Advances in Materials and Device Research, Volume 1 presents articles about junction electroluminescence; metal-insulator-semiconductor (MIS) physics; ion implantation in semiconductors; and electron transport through insulating thin films. The book describes the basic physics of carrier injection; energy transfer and recombination mechanisms; state of the art efficiencies; and future prospects for light emitting diodes. The text then discusses solid state spectroscopy, which is the pair spectra observed in gallium phosphide photoluminescence. The extensive studies.
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|a Semiconductors.
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|a Semiconductors
|0 (DNLM)D012666
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|a Semi-conducteurs.
|0 (CaQQLa)201-0318258
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|a semiconductor.
|2 aat
|0 (CStmoGRI)aat300015117
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|a TECHNOLOGY & ENGINEERING
|x Mechanical.
|2 bisacsh
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650 |
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|a Semiconductors
|2 fast
|0 (OCoLC)fst01112198
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650 |
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|a Fisica Do Estado Solido.
|2 larpcal
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|a Semiconducteurs.
|2 ram
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700 |
1 |
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|a Wolfe, Raymond,
|e editor.
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776 |
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|i Print version:
|t Applied solid state science
|z 0120029014
|w (DLC) 68059160
|w (OCoLC)11391611
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856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780120029013
|z Texto completo
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