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140627s1971 nyua o 000 0 eng d |
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|a OPELS
|b eng
|e rda
|e pn
|c OPELS
|d N$T
|d YDXCP
|d OCLCQ
|d EBLCP
|d DEBSZ
|d MERUC
|d OCLCQ
|d UKAHL
|d OCLCQ
|d OCLCO
|d OCLCQ
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|a 896795465
|a 907194989
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|a 9781483144931
|q (electronic bk.)
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|a 1483144933
|q (electronic bk.)
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|z 0125330065
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|z 9780125330060
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|a (OCoLC)881851538
|z (OCoLC)896795465
|z (OCoLC)907194989
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050 |
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4 |
|a QC176.8.T5
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072 |
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7 |
|a SCI
|x 024000
|2 bisacsh
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072 |
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|a SCI
|x 041000
|2 bisacsh
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|a SCI
|x 055000
|2 bisacsh
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|a 530.4/1
|2 22
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|a Physics of thin films :
|b advances in research and development.
|n Vol. 6 /
|c guest editors Maurice H. Francombe and Richard W. Hoffman.
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|a New York ;
|a London :
|b Academic Press,
|c 1971.
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|a 1 online resource (xiv, 370 pages) :
|b illustrations
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
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|a Print version record.
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|a REFERENCESChapter 5. Diffusion in Metallic Films; I. Introduction; II. Metal Systems; III. Experimental Methods; Iv. Experimental Results; V. Conclusions; REFERENCES; Author Index; Subject Index.
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|a Front Cover; Physics of Thin Films: Advances in Research and Development; Copyright Page; Table of Contents; Contributors to Volume 6; Preface; Contents of Previous Volumes; Chapter 1. Anodic Oxide Films; I. Introduction; II. Introductory Survey of Some General Features of Anodization; III. Theories of the Ionic Conduction Process; IV. Gaseous Anodization; V. Dielectric Properties; ACKNOWLEDGMENTS; REFERENCES; Chapter 2. Size-Dependent Electrical Conduction in Thin Metal Films and Wires; I. Introduction; II. Theory of Classical Size Effects; III. Experimental Measurements.
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|a IV. Quantum Size EffectsACKNOWLEDGMENT; REFERENCES; Chapter 3. Optical Properties of Metallic Films; I. Introduction; II. Optical Properties of Metals; III. Formulas for Thin Homogeneous and Isotropic Metallic Films; IV. Very Thin Films; V Anisotropic Films; VI. Measurement of the Optical Parameters of Metallic Films; VII. Specific Optical Properties of Thin Metallic Films; ACKNOWLEDGMENT; REFERENCES; Chapter 4. Interactions in Multilayer Magnetic Films; I. Introduction; II. Interaction Phenomena; III. Effects of Coupling; IV. Applications of Multilayer Films; V. Conclusions; ACKNOWLEDGMENTS.
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|a Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects.
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|a Thin films.
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|a Couches minces.
|0 (CaQQLa)201-0035883
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|a SCIENCE
|x Energy.
|2 bisacsh
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|a SCIENCE
|x Mechanics
|x General.
|2 bisacsh
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|a SCIENCE
|x Physics
|x General.
|2 bisacsh
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|a Thin films.
|2 fast
|0 (OCoLC)fst01150018
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|a Francombe, Maurice H.
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|a Hoffman, Richard Walther.
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776 |
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|i Print version:
|t Physics of thin films : Vol. 6
|z 0125330065
|w (OCoLC)643075913
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856 |
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|u https://sciencedirect.uam.elogim.com/science/book/9780125330060
|z Texto completo
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