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Physics of thin films : advances in research and development. Vol. 6 /

Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Francombe, Maurice H., Hoffman, Richard Walther
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York ; London : Academic Press, 1971.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects.
Descripción Física:1 online resource (xiv, 370 pages) : illustrations
Bibliografía:REFERENCESChapter 5. Diffusion in Metallic Films; I. Introduction; II. Metal Systems; III. Experimental Methods; Iv. Experimental Results; V. Conclusions; REFERENCES; Author Index; Subject Index.
ISBN:9781483144931
1483144933