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Physics of thin films : advances in research and development. Vol. 12 /
Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This boo...
| Clasificación: | Libro Electrónico |
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| Otros Autores: | , , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
New York ; London :
Academic Press,
1982.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Front Cover; Physics of Thin Films: Advances in Research and Development; Copyright Page; Table of Contents; Contributors to Volume 12; Preface; Articles Planned for Future Volumes; Contents of Previous Volumes; Chapter 1. Reflectance and Preparation of Front Surface Mirrors forUse at Various Angles of Incidence from the Ultraviolet to the Far Infrared; I. Introduction; II. Reflectance Measurements and Preparationof Mirror Coatings; III. Reflectance of Metallic Front Surface Mirrorswithout Overcoatings; IV. Mirror Coatings with Protective Layers and Reflectance-Enhancing Surface Films.
- v. Metal-Dielectric Mirrors for Useas Reflection-Type FiltersVI. Water Absorption in Evaporated Dielectric Films; References; Chapter 2. Photoemissive Materials; I. Introduction; II. The Mechanism of Photoemission; III. The Ag-O-Cs (S-1) Photocathode; IV. The Alkali Antimonides; V. Negative Electron Affinity Materials; VI. Applications of Photoemissive Materials; VII. Conclusions; ACKNOWLEDGMENTS; References; Chapter 3. Chemical Solution Deposition of Inorganic Films; I. Introduction; II. Spray Pyrolytic Process; III. Characteristic Features of the Spray Pyrolytic Process.
- IV. Multicomponent Doping and Alloying EffectsV. Structural Properties; VI. Electrical and Optical Properties; VII. Solution Growth Process; VIII. Impurity and Dopant Effects; IX. Multicomponent Films; X. Oxide Films; XI. Structure; XII. Transport Properties; XIII. Some Large-Area Applications; XIV. Concluding Remarks; References; Chapter 4. Plasma-Enhanced Chemical Vapor Depositionof Thin Films; I. Introduction; II. Deposition Techniques and Systems; III. Preparation and Properties of Films; IV. Plasma Oxidation; V. Plasma Carburizing; VI. Glow-Discharge Nitriding; VII. Conclusions.