Cargando…
Physics of thin films : advances in research and development. Vol. 12 /
Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This boo...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
New York ; London :
Academic Press,
1982.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | SCIDIR_ocn881851537 | ||
| 003 | OCoLC | ||
| 005 | 20231120111645.0 | ||
| 006 | m o d | ||
| 007 | cr cnu---unuuu | ||
| 008 | 140627s1982 nyua o 000 0 eng d | ||
| 040 | |a OPELS |b eng |e rda |e pn |c OPELS |d YDXCP |d EBLCP |d DEBSZ |d OCLCQ |d IDB |d MERUC |d OCLCQ |d OCLCO |d OCLCQ |d OCLCO | ||
| 019 | |a 895430421 | ||
| 020 | |a 9781483144993 |q (electronic bk.) | ||
| 020 | |a 1483144992 |q (electronic bk.) | ||
| 020 | |z 012533012X | ||
| 020 | |z 9780125330121 | ||
| 035 | |a (OCoLC)881851537 |z (OCoLC)895430421 | ||
| 050 | 4 | |a QC176.A1 | |
| 082 | 0 | 4 | |a 530.41 |2 22 |
| 245 | 0 | 0 | |a Physics of thin films : |b advances in research and development. |n Vol. 12 / |c edited by Georg Hass, Maurice H. Francombe, John E. Vossen. |
| 264 | 1 | |a New York ; |a London : |b Academic Press, |c 1982. | |
| 300 | |a 1 online resource (xv, 321 pages) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 588 | 0 | |a Print version record. | |
| 504 | |a ReferencesAuthor Index; Subject Index. | ||
| 505 | 0 | |a Front Cover; Physics of Thin Films: Advances in Research and Development; Copyright Page; Table of Contents; Contributors to Volume 12; Preface; Articles Planned for Future Volumes; Contents of Previous Volumes; Chapter 1. Reflectance and Preparation of Front Surface Mirrors forUse at Various Angles of Incidence from the Ultraviolet to the Far Infrared; I. Introduction; II. Reflectance Measurements and Preparationof Mirror Coatings; III. Reflectance of Metallic Front Surface Mirrorswithout Overcoatings; IV. Mirror Coatings with Protective Layers and Reflectance-Enhancing Surface Films. | |
| 505 | 8 | |a v. Metal-Dielectric Mirrors for Useas Reflection-Type FiltersVI. Water Absorption in Evaporated Dielectric Films; References; Chapter 2. Photoemissive Materials; I. Introduction; II. The Mechanism of Photoemission; III. The Ag-O-Cs (S-1) Photocathode; IV. The Alkali Antimonides; V. Negative Electron Affinity Materials; VI. Applications of Photoemissive Materials; VII. Conclusions; ACKNOWLEDGMENTS; References; Chapter 3. Chemical Solution Deposition of Inorganic Films; I. Introduction; II. Spray Pyrolytic Process; III. Characteristic Features of the Spray Pyrolytic Process. | |
| 505 | 8 | |a IV. Multicomponent Doping and Alloying EffectsV. Structural Properties; VI. Electrical and Optical Properties; VII. Solution Growth Process; VIII. Impurity and Dopant Effects; IX. Multicomponent Films; X. Oxide Films; XI. Structure; XII. Transport Properties; XIII. Some Large-Area Applications; XIV. Concluding Remarks; References; Chapter 4. Plasma-Enhanced Chemical Vapor Depositionof Thin Films; I. Introduction; II. Deposition Techniques and Systems; III. Preparation and Properties of Films; IV. Plasma Oxidation; V. Plasma Carburizing; VI. Glow-Discharge Nitriding; VII. Conclusions. | |
| 520 | |a Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with. | ||
| 650 | 0 | |a Thin films. | |
| 650 | 6 | |a Couches minces. |0 (CaQQLa)201-0035883 | |
| 650 | 7 | |a Thin films |2 fast |0 (OCoLC)fst01150018 | |
| 650 | 7 | |a Microscopia eletr�onica. |2 larpcal | |
| 700 | 1 | |a Hass, George. | |
| 700 | 1 | |a Francombe, Maurice Hubert. | |
| 700 | 1 | |a Vossen, John L. | |
| 776 | 0 | 8 | |i Print version: |t Physics of thin films : Vol. 12 |z 012533012X |w (DLC) 63016561 |w (OCoLC)222324974 |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780125330121 |z Texto completo |