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Methods of surface analysis /
Methods of Surface Analysis.
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; New York :
Elsevier Scientific Pub. Co.,
1975.
|
| Colección: | Methods and phenomena, their applications in science and technology ;
v. 1. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 245 | 0 | 0 | |a Methods of surface analysis / |c edited by A.W. Czanderna. |
| 260 | |a Amsterdam ; |a New York : |b Elsevier Scientific Pub. Co., |c 1975. | ||
| 300 | |a 1 online resource (481 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Methods and phenomena, their applications in science and technology ; |v v. 1 | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2011. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2011 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 505 | 0 | |a Front Cover; Methods of Surface Analysis; Copyright Page; Preface; Table of Contents; Introduction; Chapter 1. The aspects of sputtering in surface analysis methods; I. Introduction; II. The sputtering process; III. Specific particle bombardment aspects; IV. Outlook; References; Chapter 2. A comparison of the methods of surface analysis and their applications; I. Introduction; II. Classification of the methods for surface analysis by the incident particles used to produce an output of detectable particles; III. Electric and magnetic fields in; IV. Surface waves in; V. Conclusions; References. | |
| 505 | 8 | |a Chapter 3. Low-energy ion scattering spectrometryI. Introduction; II. Experimental equipment; III. Ion scattering principles; IV. Surface composition analysis; V. Surface structure; VI. Conclusions; Note added in proof; References; Chapter 4. Surface analysis by X-ray photoelectron spectroscopy; I. Introduction; II. Fundamentals; III. Chemical shifts; IV. Instrumentation; V. Some experimental variables; VI. Applications; VII. Summary; References; Chapter 5. Auger electron spectroscopy; I. Introduction; II. Fundamentals; III. Experimental methods; IV. Quantitative analysis; V. Applications. | |
| 505 | 8 | |a v. Chemical analysis of sputtered tantalum thin films by AES and SIMSVI. Quantitative analysis of sputtered tantalum films intentionally doped with nitrogen, carbon, and oxygen by AES and SIMS; VII. Analysis of P-doped Ta2O5 films by AES and SIMS; VIII. Analysis of platinum films containing phosphorus by AES and SIMS; IX. Analysis of alumina ceramic substrates by AES and SIMS; X. Chemical analysis of P-, As-, and B-doped silicon by SIMS and AES; XI. In-depth, bulk, and surface sensitivity comparison of AES and SIMS. | |
| 505 | 8 | |a XII. Anomalous ion yield effects produced at the surface in SIMS depth profiles .XIII. The use of high energy and low energy secondary ion discrimination in SIMS; XIV. Summary and conclusions; References; Chapter 8. The atom-probe field ion microscope; I. Introduction; II. Principles of atom-probes; III. Models of field ionization and field evaporation; IV. The TOF atom-probe; V.A 10 cm TOF atom-probe; VI. A magnetic sector atom-probe; VII. New phenomena observed with the atom-probe; VIII. Metallurgical applications; References. | |
| 520 | |a Methods of Surface Analysis. | ||
| 546 | |a English. | ||
| 650 | 0 | |a Surfaces (Technology) |x Analysis. | |
| 650 | 0 | |a Surface chemistry. | |
| 650 | 6 | |a Chimie des surfaces. |0 (CaQQLa)201-0000376 | |
| 650 | 6 | |a Surfaces (Technologie) |x Analyse. |0 (CaQQLa)201-0440005 | |
| 650 | 7 | |a SCIENCE |x Energy. |2 bisacsh | |
| 650 | 7 | |a SCIENCE |x Mechanics |x General. |2 bisacsh | |
| 650 | 7 | |a SCIENCE |x Physics |x General. |2 bisacsh | |
| 650 | 7 | |a Surface chemistry |2 fast |0 (OCoLC)fst01139210 | |
| 650 | 7 | |a Surfaces (Technology) |x Analysis |2 fast |0 (OCoLC)fst01139279 | |
| 650 | 7 | |a Aufsatzsammlung |2 gnd |0 (DE-588)4143413-4 | |
| 650 | 7 | |a Auger-Spektroskopie |2 gnd |0 (DE-588)4122843-1 | |
| 650 | 7 | |a Festk�orperoberfl�ache |2 gnd |0 (DE-588)4127823-9 | |
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| 650 | 7 | |a Surfaces (technologie) |x Analyse. |2 ram | |
| 653 | 0 | |a Surfaces (Technology) |a Analysis | |
| 700 | 1 | |a Czanderna, Alvin Warren, |d 1930- | |
| 776 | 0 | 8 | |i Print version: |t Methods of surface analysis. |d Amsterdam ; New York : Elsevier Scientific Pub. Co., 1975 |z 0444413448 |w (DLC) 76351680 |w (OCoLC)2072988 |
| 830 | 0 | |a Methods and phenomena, their applications in science and technology ; |v v. 1. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780444413444 |z Texto completo |