Nanostructures and Mesoscopic systems : Proceedings of the International Symposium, Santa Fe, New Mexico, May 20-24, 1991 /

Nanostructures and Mesoscopic systems.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: International Symposium on Nanostructures and Mesoscopic Systems Santa Fe, N.M.
Otros Autores: Kirk, Wiley P., Reed, Mark A.
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: Oxford : Elsevier Science, 1992.
Temas:
Nanostructures > Congresses.
Mesoscopic phenomena (Physics) > Congresses.
Superlattices as materials > Congresses.
Microstructure > Congresses.
Nanostructures > Congr�es.
Syst�emes m�esoscopiques > Congr�es.
Superr�eseaux > Congr�es.
Microstructure (Physique) > Congr�es.
SCIENCE > Physics > Condensed Matter.
Mesoscopic phenomena (Physics)
Microstructure
Nanostructures
Superlattices as materials
Congress
proceedings (reports)
Conference papers and proceedings
Conference papers and proceedings.
Actes de congr�es.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Front Cover; Nanostructures and Mesoscopic Systems: Proceedings of the International Symposium; Copyright Page; Table of Contents; Preface; Chapter 1. Introduction & Overview; INTRODUCTION; Chapter 2. New Challenges; NANOSTRUCTUR E PHYSICS, DEPT H VS. FASHION; I. INTRODUCTION; II. WHAT HAS BEEN LEARNED; III . SOME RECENT AND CURRENT PROGRESS; IV . PERSISTENT CURRENTS, SPECTRA LCORRELATIONS; V. CONCLUSIONS; ACKNOWLEDGEMENTS; REFERENCES; NANOSTRUCTURES IN MOTION; I . INTRODUCTION; II . MESOSCOPIC ELECTROMECHANICA LACTUATORS; III. PROCESS OUTLINE; IV. CONCLUSIONS; ACKNOWLEDGEMENT; REFERENCES.
  • Chapter 3. Advances in Nanostructure FabricationPatterning Techniques for sub-100 nm Devices, Circuits and Systems *; Abstract; Extending Conventional Technology; Sub-Optical Techniques; Radically New Approaches; References; CLEAVED EDGE OVERGROWTH: A ROUTE TO ATOMICALLYPRECISE LOWER DIMENSIONAL STRUCTURES; L INTRODUCTION; II. 2D ELECTRON GAS ON CLEAVED GaAs; III. ATOMICALLY PRECISE SUPERLATTICE IN 2D; IV. CLEAVED EDGE OVERGROWTH FOR EVERYTHING; REFERENCES; SEMICONDUCTOR QUANTUM WIRES GROWN BY OMCV EON NONPLANAR SUBSTRATES; I. INTRODUCTION; . 2D QUANTUM CONFINEMENT IN TAPERED QUANTUM WELLS.
  • ��e. qwr structure and optical propertiesiv. quantum wire lasers; v. conclusion; acknowledgements:; references:; can a device be made with atomic precision; i. introduction; ii. using the dipole force to manipulate an atomicbeam; ��e. manipulating an atomic beam on a mesoscopicscale; iv. manipulating an atomic beam on a nanometer scale; references; direct writing of nickel wires using a scanningtunneling microscope / scanning electron microscopesystem; i. introduction; ii. apparatus and procedures; iii. results; iv. conclusion; acknowledgement; references.
  • FABRICATION OF NANOSTRUCTURE ARRAYS USINGPROJECTION ELECTRON-BEAM LITHOGRAPHYI. Introduction; II. Projection Electron-Beam Lithography and the SCALPELTechnique; III. Mask Fabrication; IV, Step and Repeat Tool for Array Fabrication; V� Conclusions; Acknowledgements; REFERENCES; Chapter 4. Ballistic Transport and Coherence; BALLISTIC ELECTRON OPTICS IN TWODIMENSIONAL ELECTRON SYSTEMS; I. INTRODUCTION; II. DIRECT MEASURE OF BALLISTI\C MEAN FREE PATH; III . OHMIC CONTACT INJECTORS AND DETECTORS; IV. ABSORBERS; V. REFRACTION OF BALLISTIC ELECTRONS; VI. NONINTERACTG BEAMS OF BALLISTI CELECTRONS.
  • Vii . conclusionacknowledgement; references; interference and dephasing byelectron-electron interaction in ballisti cconductors; i. introduction; ii . experiment; iii . dephasin g in 2d conductors, a broader vie; iv. summary; acknowledgement; references; ballistic electron propagation inmacroscopi cfour-terminal square structures; i. introduction; i i . sample preparation; i i i . rb and rh inlandauer
  • buettiker formula; iv. bend resistance characteristics; v� hall resistance characteristics; vi. conclusions; acknowledgement; references.

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