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Ion Beam Processing of Materials and Deposition Processes of Protective Coatings : Proceedings of Symposium C, Symposium J and Symposium H of the 1995 E-Mrs Spring Conference, Strasbourg, France, May 22-26, 1995 /

Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation Strasbourg, France
Otros Autores: Hemment, P. L. F. (Peter L. F.)
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: Oxford : Elsevier Science, 1996.
Colección:European Materials Research Society symposia proceedings.
Temas:
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Front Cover; Ion Beam Processing of materials and Deposition Processes of Protective Coatings; Copyright Page; Part I: Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation; E-MRS'95 Symposium J Preface; E-MRS'95 Symposium C Preface; Table of Contents; Section I. Fundamental Aspects of Cluster Collisions; Chapter 1. Molecule and cluster bombardment: energy loss, trajectories, and collision cascades; 1. Introduction; 2. Stopping and straggling; 3. Trajectory correlations; 4. Kinematics of collision cascades; 5. Concluding remarks; Acknowledgement; References.
  • Chapter 2. Nonlinear transmission sputtering1. Introduction; 2. Correlated transmission sputtering; 3. Pair correlations; 4. Multiple scattering; 5. Discussion; Acknowledgement; References; Chapter 3. Molecular dynamics study of shock wave generation by cluster impact on solid targets; 1. Introduction; 2. The model; 3. Results and discussions; 4. Summary; References; Chapter 4. Track formation in metals by electronic processes using atomic and cluster ions; References; Chapter 5. Atomic and cluster ion bombardment in the electronic stopping power regime: A thermal spike description.
  • 1. Introduction2. Physical basis; 3. Results and discussion; 4. Conclusion; References; Section II. Production, Acceleration and Diagnostics of High Intensity Beams and of Molecular Ions a; Chapter 6. Production, acceleration and diagnostics of high intensity beams; 1. Introduction; 2. Methods of ion production from solids; 3. High current ion sources; 4. Extraction and ion beam transport; 5. Diagnosis of high current ion beams; References; Chapter 7. Production, acceleration and diagnostics of molecular ions and ionized clusters; 1. Introduction.
  • 2. Cluster ion beams produced with a tandem accelerator3. The ORION-TANDEM project; 4. A macromolecular accelerator; 5. Conclusion; Acknowledgement; References; Section III. Surface Phenomena, Photon, Electron or Ion Emission, Sputtering; Chapter 8. Hyperthermal chemistry and cluster collisions; 1. Introduction; 2. Experimental; 3. Gas phase collisions; 4. C+60surface collisions; 5. Conclusion; Acknowledgements; References; Chapter 9. A plasma desorption mass spectrometry study of cluster ion formation from group IIA nitrates; 1� Introduction; 2. Experimental; 3. Results and discussion.
  • 4. ConclusionsAcknowledgments; References; Chapter 10. Sputtering of large size clusters from solids bombarded by high energy cluster ions and fullerenes; 1. Introduction; 2. Experimental; 3. Results and discussion; 4. Conclusion; Acknowledgements; References; Chapter 11. Acceleration of clusters, collision induced charge exchange at MeV energies and applications for materials science; 1. Introduction; 2. Production of negatively charged cluster ions; 3. The stripping process; 4. Detection and identification of the high energy clusters; 5. Measurements and results; 6. Conclusion; References.