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Ion Beam Processing of Materials and Deposition Processes of Protective Coatings : Proceedings of Symposium C, Symposium J and Symposium H of the 1995 E-Mrs Spring Conference, Strasbourg, France, May 22-26, 1995 /

Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: Symposium J on Correlated Effects in Atomic and Cluster Ion Bombardment and Implantation Strasbourg, France
Otros Autores: Hemment, P. L. F. (Peter L. F.)
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: Oxford : Elsevier Science, 1996.
Colección:European Materials Research Society symposia proceedings.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation. Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric c.
Notas:Chapter 12. The use of coincidence counting mass spectrometry to study the emission and metastable dissociation of cluster ions.
Descripción Física:1 online resource (630 pages)
ISBN:9780444596314
0444596313