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In-situ characterization of thin film growth /
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an impo...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Cambridge ; Philadelphia, PA :
Woodhead Pub.,
2011.
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| Colección: | Woodhead Publishing in materials.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 245 | 0 | 0 | |a In-situ characterization of thin film growth / |c edited by Gertjan Koster and Guus Rijnders. |
| 260 | |a Cambridge ; |a Philadelphia, PA : |b Woodhead Pub., |c 2011. | ||
| 300 | |a 1 online resource (xi, 282 pages) : |b illustrations. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Woodhead Publishing in materials | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 520 | |a Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurementsDiscusses the principles and applications of photoemission techniquesExamines alternative in situ characterisation techniques. | ||
| 505 | 0 | |a Cover; In situcharacterization ofthin film growth; Copyright; Contents; Contributor contact details; Part I Electron diffraction techniques for studying thin film growth in situ; 1 Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth; 1.1 Reflection high-energy electron diffraction (RHEED) and pulsed laser deposition (PLD); 1.2 Basic principles of RHEED; 1.3 Analysis of typical RHEED patterns: the influence of surface disorder; 1.4 Crystal growth: kinetics vs thermodynamics; 1.5 Variations of the specular intensity during deposition. | |
| 505 | 8 | |a 1.6 Kinetical growth modes and the intensity response in RHEED1.7 RHEED intensity variations and Monte Carlo simulations; 1.8 Conclusions; 1.9 Acknowledgements; 1.10 References; 2 Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction; 2.1 Introduction; 2.2 Kikuchi patterns; 2.3 Kikuchi lines in reflection high-energy electron diffraction (RHEED) images; 2.4 Dual-screen RHEED and Kikuchi pattern collection; 2.5 Lattice parameter determination; 2.6 Epitaxial film strain determination; 2.7 Kinematic and dynamic scattering. | |
| 505 | 8 | |a 2.8 Epitaxial film structure determination2.9 Conclusion; 2.10 References; Part II Photoemission techniques for studying thin film growth in situ; 3 Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth; 3.1 Introduction; 3.2 Principles of ultraviolet photoemission spectroscopy (UPS); 3.3 Applications of UPS to thin film systems; 3.4 Future trends; 3.5 References; 4 X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth; 4.1 Introduction; 4.2 In situ monitoring of thin film growth. | |
| 505 | 8 | |a 4.3 Measuring the reaction of thin films with gases using ambient pressure X-ray photoelectron spectroscopy (XPS)4.4 In situ measurements of buried interfaces using high kinetic energy XPS (HAXPES); 4.5 Conclusions; 4.6 Acknowledgments; 4.7 References; 5 In situ spectroscopic ellipsometry (SE) for characterization of thin film growth; 5.1 Introduction; 5.2 Principles of ellipsometry; 5.3 In situ spectroscopic ellipsometry (SE) characterization; 5.4 In situ considerations; 5.5 Further In situ SE examples; 5.6 Conclusions; 5.7 Sources of further information and advice; 5.8 Acknowledgments. | |
| 505 | 8 | |a 5.9 ReferencesPart III Alternative in situ characterization techniques; 6 In situ ion beam surface characterization of thin multicomponent films; 6.1 Introduction; 6.2 Background to ion backscattering spectrometry and time-of-flight (TOF) ion scattering and recoil methods; 6.3 Experimental set-ups; 6.4 Studies of film growth processes relevant to multicomponent oxides; 6.5 Conclusions; 6.6 Acknowledgments; 6.7 References; 7 Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth; 7.1 Introduction. | |
| 650 | 0 | |a Thin films |x Analysis. | |
| 650 | 0 | |a Crystal growth. | |
| 650 | 6 | |a Couches minces |0 (CaQQLa)201-0035883 |x Analyse. |0 (CaQQLa)201-0374819 | |
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| 650 | 7 | |a SCIENCE |x Energy. |2 bisacsh | |
| 650 | 7 | |a SCIENCE |x Mechanics |x General. |2 bisacsh | |
| 650 | 7 | |a SCIENCE |x Physics |x General. |2 bisacsh | |
| 650 | 7 | |a Crystal growth |2 fast |0 (OCoLC)fst00884619 | |
| 650 | 7 | |a Thin films |x Analysis |2 fast |0 (OCoLC)fst01150019 | |
| 700 | 1 | |a Koster, Gertjan, |d 1971- | |
| 700 | 1 | |a Rijnders, Guus. | |
| 776 | 0 | 8 | |i Print version: |t In-situ characterization of thin film growth. |d Cambridge ; Philadelphia, PA : Woodhead Pub., 2011 |z 9781845699345 |z 1845699343 |
| 830 | 0 | |a Woodhead Publishing in materials. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9781845699345 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9781845699345 |z Texto completo |