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111114s1992 enk o 000 0 eng d |
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d OPELS
|d OCLCF
|d YDXCP
|d OCLCQ
|d UAB
|d OCLCQ
|d OCLCO
|d COM
|d OCLCO
|d OCLCQ
|d OCLCO
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|a 0125330162
|q (electronic bk.)
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|a 9780125330169
|q (electronic bk.)
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|a (OCoLC)760965359
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|a QC176
|b P49 1992
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|a 530.4175
|2 20
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|a Physics of Thin Films :
|b Advances in Research and Development.
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|b Academic P.
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|a 1 online resource ([384] pages)
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336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Vol. 16. Thin Films for Emerging Applications / edited by M.H. Francombe and J.C. Vossen. 1992.
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|a Print version record.
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|a Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.
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|a Thin films
|v Periodicals.
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|a Couches minces
|0 (CaQQLa)201-0035883
|v P�eriodiques.
|0 (CaQQLa)201-0378307
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|a Thin films
|2 fast
|0 (OCoLC)fst01150018
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|a Physics
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|a Periodical
|0 (DNLM)D020492
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|a periodicals.
|2 aat
|0 (CStmoGRI)aatgf300026657
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|a Periodicals
|2 fast
|0 (OCoLC)fst01411641
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7 |
|a Periodicals.
|2 lcgft
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|a P�eriodiques.
|2 rvmgf
|0 (CaQQLa)RVMGF-000001105
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700 |
1 |
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|a Francombe, Maurice H.
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700 |
1 |
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|a Vossen, John C.
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776 |
0 |
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|i Print version:
|t Physics of Thin Films.
|d Academic P
|w (OCoLC)26306595
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856 |
4 |
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|u https://sciencedirect.uam.elogim.com/science/book/9780125330169
|z Texto completo
|