Electromigration in thin films and electronic devices : materials and reliability /
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...
Clasificación: | Libro Electrónico |
---|---|
Otros Autores: | Kim, Choong-Un |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Oxford :
Woodhead Pub.,
2011.
|
Colección: | Woodhead Publishing in materials.
|
Temas: | |
Acceso en línea: | Texto completo |
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