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SCIDIR_ocn714902537 |
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OCoLC |
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20231117044604.0 |
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m o d |
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110425s1989 caua ob 001 0 eng d |
040 |
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d OCLCF
|d OCLCQ
|d UIU
|d OCLCO
|d EBLCP
|d N$T
|d DEBSZ
|d OCLCQ
|d UAB
|d MERUC
|d OCLCQ
|d STF
|d OCLCQ
|d OCLCO
|d OCLCQ
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019 |
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|a 761320474
|a 897652073
|a 987646750
|a 1187187106
|a 1197570032
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020 |
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|a 9781483217857
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|a 148321785X
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|z 9780122341212
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020 |
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|z 012234121X
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035 |
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|a (OCoLC)714902537
|z (OCoLC)761320474
|z (OCoLC)897652073
|z (OCoLC)987646750
|z (OCoLC)1187187106
|z (OCoLC)1197570032
|
042 |
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|a dlr
|
050 |
|
4 |
|a TK7874
|b .V56 v.21
|
072 |
|
7 |
|a TEC
|x 009070
|2 bisacsh
|
082 |
0 |
4 |
|a 621.395
|
245 |
0 |
0 |
|a Beam processing technologies /
|c edited by Norman G. Einspruch, S.S. Cohen, Raj N. Singh.
|
260 |
|
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|a San Diego, Calif. :
|b Academic Press,
|c �1989.
|
300 |
|
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|a 1 online resource (xii, 546 pages) :
|b illustrations
|
336 |
|
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|a text
|b txt
|2 rdacontent
|
337 |
|
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|a computer
|b c
|2 rdamedia
|
338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
490 |
1 |
|
|a VLSI electronics : microstructure science ;
|v v. 21
|
504 |
|
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|a Includes bibliographical references and index.
|
506 |
|
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
533 |
|
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|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2011.
|5 MiAaHDL
|
538 |
|
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|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
583 |
1 |
|
|a digitized
|c 2011
|h HathiTrust Digital Library
|l committed to preserve
|2 pda
|5 MiAaHDL
|
588 |
0 |
|
|a Print version record.
|
650 |
|
0 |
|a Integrated circuits
|x Very large scale integration.
|
650 |
|
0 |
|a Electron beams.
|
650 |
|
0 |
|a Ion bombardment.
|
650 |
|
0 |
|a Molecular beam epitaxy.
|
650 |
|
6 |
|a Circuits int�egr�es �a tr�es grande �echelle.
|0 (CaQQLa)201-0117255
|
650 |
|
6 |
|a Faisceaux �electroniques.
|0 (CaQQLa)201-0004712
|
650 |
|
6 |
|a Bombardement ionique.
|0 (CaQQLa)201-0004234
|
650 |
|
6 |
|a �Epitaxie par jets mol�eculaires.
|0 (CaQQLa)201-0282349
|
650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Mechanical.
|2 bisacsh
|
650 |
|
7 |
|a Electron beams.
|2 fast
|0 (OCoLC)fst00906654
|
650 |
|
7 |
|a Integrated circuits
|x Very large scale integration.
|2 fast
|0 (OCoLC)fst00975602
|
650 |
|
7 |
|a Ion bombardment.
|2 fast
|0 (OCoLC)fst00978567
|
650 |
|
7 |
|a Molecular beam epitaxy.
|2 fast
|0 (OCoLC)fst01024729
|
700 |
1 |
|
|a Einspruch, Norman G.
|
700 |
1 |
|
|a Cohen, Simon S.
|q (Simon S.)
|
700 |
1 |
|
|a Singh, Raj N.
|
776 |
0 |
8 |
|i Print version:
|t Beam processing technologies.
|d San Diego, Calif. : Academic Press, �1989
|w (OCoLC)20029544
|
830 |
|
0 |
|a VLSI electronics ;
|v v. 21.
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780122341212
|z Texto completo
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/bookseries/07367031/21
|z Texto completo
|