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Advances in imaging and electron physics. Volume 164 /
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at hig...
| Clasificación: | Libro Electrónico |
|---|---|
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam :
Academic Press,
2010.
|
| Colección: | Advances in imaging and electron physics ;
164 |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
MARC
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| 245 | 0 | 0 | |a Advances in imaging and electron physics. |n Volume 164 / |c edited by Peter W. Hawkes. |
| 260 | |a Amsterdam : |b Academic Press, |c 2010. | ||
| 300 | |a 1 online resource (373 pages) : |b color illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 0 | |a Advances in imaging and electron physics ; |v 164 | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 520 | |a Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. * Contributions from leading international scholars and industry experts * Discusses hot topic areas and presents current and future research trends * Invaluable reference and guide for physicists, engineers and mathematicians. | ||
| 505 | 0 | |a Front Cover; Advances in Imaging and Electron Physics; Copyright Page; Contents; Preface; Contributors; Future Contributions; Chapter 1: Magnetolithography: From the Bottom-Up Route to HighThroughput; 1. Introduction; 2. The Magnetolithography Method; 3. Patterning of Non-Flat Surfaces; 4. Summary and Future Perspective; Acknowledgments; References; Chapter 2: The Optics of Spatial Coherence Wavelets; 1. Introduction; 2. Basic Concepts and Mathematical Formalism; 3. Interference and Diffraction with Scalar Wavelets; 4. Tensor Wavelets and Electromagnetic Fields; Acknowledgments; References | |
| 505 | 8 | |a Chapter 3: Common Diffraction Integral Calculation Based on a Fast Fourier Transform Algorithm1. Introduction; 2. Relation Between Discrete Fourier Transform and Fourier Transform; 3. Fast Fourier Transform of Fresnel Diffraction; 4. Numerical Integration of Classic Diffraction; 5. The Collins Formula and Its Inverse Operation; 6. Discussion and Conclusion; References; Chapter 4: A Generalized Approach to Describe the Interference Contrast and the Phase Contrast Method; 1. Introduction; 2. The Interferometric Phase Contrast; 3. General Perspective of the Phase Contrast Method; 4. Conclusion | |
| 546 | |a English. | ||
| 650 | 0 | |a Optoelectronic devices. | |
| 650 | 0 | |a Optical data processing. | |
| 650 | 6 | |a Dispositifs opto�electroniques. |0 (CaQQLa)201-0012482 | |
| 650 | 6 | |a Traitement optique de l'information. |0 (CaQQLa)201-0023313 | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Imaging Systems. |2 bisacsh | |
| 650 | 7 | |a Optical data processing |2 fast |0 (OCoLC)fst01046675 | |
| 650 | 7 | |a Optoelectronic devices |2 fast |0 (OCoLC)fst01046908 | |
| 776 | 0 | 8 | |i Print version: |t Advances in imaging and electron physics. Volume 164. |d London : Academic, 2010 |z 9780123813121 |w (OCoLC)655650444 |
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| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/10765670/164 |z Texto completo |