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Intermetallic semiconducting films

Intermetallic Semiconducting Films introduces the physics and technology of A??v compound films. This material is a type of a polycrystalline semiconductor that is used for galvanomagnetic device applications. Such material has a high electron mobility that is ideal for generators and magnetoresisto...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Wieder, H. H., 1919-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Oxford, New York, Pergamon Press [1970]
Edición:[1st ed.].
Colección:International series of monographs on semiconductors ; v. 10.
Temas:
Acceso en línea:Texto completo

MARC

LEADER 00000cam a2200000 4500
001 SCIDIR_ocn681902396
003 OCoLC
005 20231117044529.0
006 m o d
007 cr bn||||||abp
007 cr bn||||||ada
008 101117s1970 enka ob 001 0 eng d
040 |a OCLCE  |b eng  |e pn  |c OCLCE  |d OCLCQ  |d OCLCF  |d OCLCO  |d OPELS  |d OCLCQ  |d LUN  |d OCLCQ  |d OCLCO  |d COM  |d OCLCO  |d OCLCQ  |d OCLCO 
019 |a 631205407  |a 974617693 
020 |a 9780080133676  |q (electronic bk.) 
020 |a 0080133673  |q (electronic bk.) 
035 |a (OCoLC)681902396  |z (OCoLC)631205407  |z (OCoLC)974617693 
042 |a dlr 
050 4 |a QC612.S4 
082 0 4 |a 537.6/22  |2 18 
082 0 4 |a 537.6/27 
084 |a UP 7570  |2 rvk 
100 1 |a Wieder, H. H.,  |d 1919- 
245 1 0 |a Intermetallic semiconducting films  |c [by] H.H. Wieder. 
250 |a [1st ed.]. 
260 |a Oxford,  |a New York,  |b Pergamon Press  |c [1970] 
300 |a 1 online resource (x, 361 pages)  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a International series of monographs in semiconductors ;  |v v. 10 
504 |a Includes bibliographical references (pages 343-358). 
506 |3 Use copy  |f Restrictions unspecified  |2 star  |5 MiAaHDL 
533 |a Electronic reproduction.  |b [Place of publication not identified] :  |c HathiTrust Digital Library,  |d 2010.  |5 MiAaHDL 
538 |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.  |u http://purl.oclc.org/DLF/benchrepro0212  |5 MiAaHDL 
583 1 |a digitized  |c 2010  |h HathiTrust Digital Library  |l committed to preserve  |2 pda  |5 MiAaHDL 
588 0 |a Print version record. 
520 |a Intermetallic Semiconducting Films introduces the physics and technology of A??v compound films. This material is a type of a polycrystalline semiconductor that is used for galvanomagnetic device applications. Such material has a high electron mobility that is ideal for generators and magnetoresistors. 
650 0 |a Thin films  |x Electric properties. 
650 0 |a Semiconductor films. 
650 6 |a Couches �a semi-conducteurs.  |0 (CaQQLa)201-0087607 
650 7 |a Semiconductor films  |2 fast  |0 (OCoLC)fst01112128 
650 7 |a Thin films  |x Electric properties  |2 fast  |0 (OCoLC)fst01150024 
650 7 |a Halbleiterschicht  |2 gnd  |0 (DE-588)4158812-5 
650 7 |a Couches minces  |x Propri�et�es �electriques.  |2 ram 
650 7 |a Couches minces semiconductrices.  |2 ram 
776 0 8 |i Print version:  |a Wieder, H.H., 1919-  |t Intermetallic semiconducting films.  |b [1st ed.].  |d Oxford, New York, Pergamon Press [1970]  |w (DLC) 76080293  |w (OCoLC)98057 
830 0 |a International series of monographs on semiconductors ;  |v v. 10. 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9780080133676  |z Texto completo