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Developments in surface contamination and cleaning /

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Kohli, Rajiv, 1947-, Mittal, K. L., 1945-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Norwich, NY, U.S.A. : W. Andrew Pub., �2008-
Temas:
Acceso en línea:Texto completo

MARC

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245 0 0 |a Developments in surface contamination and cleaning /  |c edited by Rajiv Kohli and Kashmiri L. Mittal. 
260 |a Norwich, NY, U.S.A. :  |b W. Andrew Pub.,  |c �2008- 
300 |a 1 online resource :  |b illustrations (some color) 
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520 |a Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination Covers contamination and cleaning issues at the nanoscale Includes an in-depth look at ultrasonic cleaning 
505 0 |a Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning. 
504 |a Includes bibliographical references and index. 
505 0 |a [v. 1.] Fundamentals and applied aspects -- v. 2. Particle deposition, control and removal. 
588 0 |a Print version record. 
650 0 |a Surfaces (Technology)  |x Inspection. 
650 0 |a Surface contamination  |x Prevention. 
650 0 |a Particles  |x Measurement. 
650 0 |a Cleaning. 
650 0 |a Coatings. 
650 0 |a Dust control. 
650 6 |a Surfaces (Technologie)  |0 (CaQQLa)201-0031190  |x Inspection.  |0 (CaQQLa)201-0374051 
650 6 |a Nettoyage.  |0 (CaQQLa)201-0075751 
650 6 |a Rev�etements.  |0 (CaQQLa)201-0002935 
650 6 |a Poussi�ere  |x Lutte contre.  |0 (CaQQLa)201-0076798 
650 7 |a cleaning.  |2 aat  |0 (CStmoGRI)aat300053027 
650 7 |a coating (material)  |2 aat  |0 (CStmoGRI)aat300014907 
650 7 |a Cleaning  |2 fast  |0 (OCoLC)fst00863895 
650 7 |a Coatings  |2 fast  |0 (OCoLC)fst00865859 
650 7 |a Dust control  |2 fast  |0 (OCoLC)fst00899652 
650 7 |a Particles  |x Measurement  |2 fast  |0 (OCoLC)fst01054123 
650 7 |a Surfaces (Technology)  |x Inspection  |2 fast  |0 (OCoLC)fst01139285 
700 1 |a Kohli, Rajiv,  |d 1947- 
700 1 |a Mittal, K. L.,  |d 1945- 
776 0 8 |i Print version:  |t Developments in surface contamination and cleaning.  |d Norwich, NY, U.S.A. : W. Andrew Pub., �2008-  |z 9780815515555  |w (OCoLC)518052237 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9781437778304  |z Texto completo