Cargando…

Advances in electronics and electron physics Volume 17 /

ADV ELECTRONICS ELECTRON PHYSICS V17.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Marton, L. (Ladislaus), 1901-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York : Academic Press, �1962.
Colección:Advances in electronics and electron physics ; v. 17
Temas:
Acceso en línea:Texto completo

MARC

LEADER 00000cam a2200000Ma 4500
001 SCIDIR_ocn646754938
003 OCoLC
005 20231117033222.0
006 m o d
007 cr cn|||||||||
008 081026s1962 nyua ob 001 0 eng d
010 |z  49007504  
040 |a E7B  |b eng  |e pn  |c E7B  |d OCLCQ  |d N$T  |d IDEBK  |d OCLCQ  |d OPELS  |d OCLCQ  |d OCLCF  |d OCLCQ  |d DEBSZ  |d LEAUB  |d VLY  |d OCLCO  |d OCLCQ  |d OCLCO 
019 |a 268661427  |a 1162035852 
020 |a 9780080576787  |q (electronic bk.) 
020 |a 0080576788  |q (electronic bk.) 
020 |a 0120145170  |q (electronic bk.) 
020 |a 9780120145171  |q (electronic bk.) 
020 |a 1281411140 
020 |a 9781281411143 
020 |a 9786611411145 
020 |a 6611411143 
035 |a (OCoLC)646754938  |z (OCoLC)268661427  |z (OCoLC)1162035852 
050 4 |a TK7800  |b .A3717 1962eb 
072 7 |a TEC  |x 008070  |2 bisacsh 
072 7 |a TEC  |x 008060  |2 bisacsh 
082 0 4 |a 621.381  |2 22 
245 0 0 |a Advances in electronics and electron physics  |n Volume 17 /  |c edited by L. Marton. 
260 |a New York :  |b Academic Press,  |c �1962. 
300 |a 1 online resource (x, 451 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 0 |a Advances in electronics and electron physics ;  |v v. 17 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Cover; Contents; Contributors to Volumes 17; Foreword; Chapter 1. The General Perturbational Theory of Space-Harmonic Traveling-Wive Electron Interaction; I. Introduction; II. Self and Mutual Beam-Circuit Capacitances, and Beam-Circuit Coupling Coefficients; III. The Electrokinetic Bunching Equations; IV. The Circuit Equations; V. Complex Exponential Notation for Beam and Circuit Variable; VI. Voltage-Ratio Beam-Circuit Coupling Coefficient ?v, for a Spatially Periodic Structure; VII. Beam-Circuit Self-capacitance Cq, Governing the Space-Charge Voltage 
505 8 |a VIII. Charge-Ratio and Voltage-Ratio Beam-Circuit Coupling CoefficientsIX. The Space-Harmonic Interaction Characteristic Equation; X. The Gain, Space-Charge, and Circuit Loss Parameters; XI. Normalization Relative to the Gain Parameter Ca; XII. Expressions for Growing-Wave Hot-Circuit Gain and Cold- Circuit Loss in Terms of Tube Length; XIII. The First-Order Quartics for Propagation-Constant Perturbation Due to Space-Harmonic Interaction; XIV. Graphical Study of the Perturbational Quartic Equation; XV. The Quartic for Drive of the Forward Total Wave; XVI. Frequency Offset Effects 
505 8 |a Reduction to CubicXVII. The Nearly-Cubic Quartic, for Zero Values of Frequency Offset, Loss, and Space Charge; XVIII. The Electrokinetic Boundary Conditions at Electron Entrance into the rf Field; XIX. The Electromagnetic Conditions at Electron Entrance to and Exit from rf Field; XX. Relative Amplitudes of the Four Perturbed Waves; Voltage Gain; XXI. Phasor Representation of Backward-Wave Gain-Producing Interference; XXII. Backward-Wave Gain Evaluation; XXIII. The Start-Oscillation Conditions; XXIV. Start-Oscillation Current and Device Length; Voltage Tunability; Gain Bandwidth Product 
505 8 |a XXV. Concluding CommentsReferences; Chapter 2. Thermionic Energy Conversion; I. Introduction; II. Idealized Model of a Thermionic Converter; III. The Work Function of Various Surfaces; IV. Vacuum Thermionic Energy Converters; V. Cesium Thermionic Energy Converters; VI. Devices Using Auxiliary Discharges; VII. Devices Using Fission Fragments for Ion Production; VIII. Applications of Thermionic Converters; IX. Summary and Future Trends; References; Chapter 3. Thermoelectricity; I. Introduction; II. Basic Considerations; III. Materials; IV. Practical Considerations 
505 8 |a V. Thermoelectric ApplicationsVI. Theory and Problems; References; Chapter 4. Impact Evaporation and Thin Film Growth in a Glow Discharge; I. Introduction; II. Emission of Charged Particles from Metal Surfaces by Energetic Particles; III. High Vacuum Impact Evaporation (Cathode Sputtering); IV. Glow Discharge Characteristics; V. Nucleation and Film Growth in High Vacuum Environment; VI. Film Growth in Glow Discharge Environment; VII. Reactive Impact Evaporation; References; Chapter 5. Ultrahigh Vacuum; I. Introduction; II. Physical Processes; III. Technology of Ultrahigh Vacuum 
520 |a ADV ELECTRONICS ELECTRON PHYSICS V17. 
546 |a English. 
650 0 |a Electronics. 
650 0 |a Atomic beams. 
650 2 |a Electronics  |0 (DNLM)D004581 
650 6 |a �Electronique.  |0 (CaQQLa)201-0001759 
650 6 |a Faisceaux atomiques.  |0 (CaQQLa)201-0006723 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Microelectronics.  |2 bisacsh 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Digital.  |2 bisacsh 
650 7 |a Atomic beams  |2 fast  |0 (OCoLC)fst00820567 
650 7 |a Electronics  |2 fast  |0 (OCoLC)fst00907538 
700 1 |a Marton, L.  |q (Ladislaus),  |d 1901- 
776 0 8 |i Print version:  |t Advances in electronics and electron physics.  |d New York : Academic Press, �1962  |w (DLC) 49007504 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9780120145171  |z Texto completo