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081026s1965 nyua ob 001 0 eng d |
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|z 49007504
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|a E7B
|b eng
|e pn
|c E7B
|d OCLCQ
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|d OPELS
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|a 268661824
|a 1162394291
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|a 9780080576824
|q (electronic bk.)
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|a 0080576826
|q (electronic bk.)
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|a 0120145219
|q (electronic bk.)
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|a 9780120145218
|q (electronic bk.)
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|a 1281411159
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|a 9781281411150
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|a (OCoLC)646754284
|z (OCoLC)268661824
|z (OCoLC)1162394291
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|a TK7800
|b .A3721 1965eb
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|a TEC
|x 008070
|2 bisacsh
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|a TEC
|x 008060
|2 bisacsh
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|a 621.381
|2 22
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|a Advances in electronics and electron physics.
|n Volume 21 /
|c edited by L. Marton.
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260 |
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|a New York :
|b Academic Press,
|c �1965.
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300 |
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|a 1 online resource (x, 346 pages) :
|b illustrations.
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336 |
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Advances in electronics and electron physics ;
|v v. 21
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|a Includes bibliographical references and index.
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|a Print version record.
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|a Cover; Contents; Contributors to Volume 21; Foreword; Chapter 1. The Polarization of Electron Beams and the Measurement of the g-Factor Anomaly of Free Electrons; I. Introduction; II. Description of Polarized Electron Beams; III. The Effect of Macroscopic Fields on Polarization; IV. The Production of Polarized Beams; V. The Measurement of the g-Factor Anomaly of Free Electrons; References; Chapter 2. Fast Ion Scattering against Metal Surfaces; I. Introduction; II. The Dynamics of Two-Atom Collisions; III. Scattering Experiments with Solid Targets
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|a IV. Light Emission From Ion-Bombarded Metal TargetsReferences; Chapter 3. Kinetic Ejection of Electrons from Solids; I. Introduction and Background; II. Experimental Techniques; III. Experimental Results; IV. Theory; V. Conclusions and Probable Trends; References; Chapter 4. Scanning Electron Microscopy; I. Introduction; II. Principles of Design of the Scanning Electron Microscope; III. Techniques and Applications; References; Chapter 5. High-Speed Magnetic-Core Memory Technology; I. Introduction; II. Coincident-Current Toroidal Core Storage; III. Two-Dimensional Core Memory
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|a IV. Special Ferrite Storage Devices and MemoriesReferences; Chapter 6. Physical Foundations of Plasma Applications for Generation and Amplidcation of Microwaves; I. Introduction; II. Slow Waves in Plasma; III. Interaction of Slow Waves with Electron Stream; IV. Plasma Traveling Wave Tube; V. Plasma Backward Wave Generator; VI. Interaction on Longitudinal Waves; VII. Operating-Wavelength Shortening Problems in Plasma Devices; VIII. Experiments on Amplification and Generation of Millimeter Band Oscillations by Means of Plasma; IX. Conclusion; List of Symbols; References; Author Index
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520 |
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|a ADV ELECTRONICS ELECTRON PHYSICS V21.
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546 |
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|a English.
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650 |
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|a Electronics.
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650 |
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|a Electron beams.
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650 |
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|a �Electronique.
|0 (CaQQLa)201-0001759
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650 |
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6 |
|a Faisceaux �electroniques.
|0 (CaQQLa)201-0004712
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650 |
|
7 |
|a electronic engineering.
|2 aat
|0 (CStmoGRI)aat300253978
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650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Microelectronics.
|2 bisacsh
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650 |
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7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Digital.
|2 bisacsh
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650 |
|
7 |
|a Electron beams
|2 fast
|0 (OCoLC)fst00906654
|
650 |
|
7 |
|a Electronics
|2 fast
|0 (OCoLC)fst00907538
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700 |
1 |
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|a Marton, L.
|q (Ladislaus),
|d 1901-
|
776 |
0 |
8 |
|i Print version:
|t Advances in electronics and electron physics. Volume 21.
|d New York : Academic Press, �1965
|w (DLC) 49007504
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780120145218
|z Texto completo
|