Ion implantation and beam processing /

Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semicond...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Williams, James S. (James Stanislaus), 1948-, Poate, J. M.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Sydney ; New York : Academic Press, 1984.
Temas:
Ion implantation.
Ion bombardment.
Semiconductor doping.
Electron beams.
Ions > Implantation.
Bombardement ionique.
Semi-conducteurs > Dopage.
Faisceaux �electroniques.
TECHNOLOGY & ENGINEERING > Mechanical.
Electron beams
Ion bombardment
Ion implantation
Semiconductor doping
Ionenimplantation
Semiconductors > Implantation of ions
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Introduction to implantation and beam processing / J.S. Williams, J.M. Poate
  • Amorphization and crystallization of semiconductors / J.M. Poate, J.S. Williams
  • Applications of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets / J.F. Gibbons, L.A. Christel
  • High energy density collision cascades and spike effects / J.A. Davies
  • Implantation of insulators: ices and lithographic materials / W.L. Brown
  • Ion-bombardment-induced composition changes in alloys and compounds / Hans Henrik Andersen
  • Ion beam and laser mixing: fundamentals and applications / B.R. Appleton
  • High-does implantation / D.G. Beanland
  • Trends of ion implantation in silicon technology / H.S. Rupprecht, A.E. Michel
  • Implantation in Ga AS technology / F.H. Eisen
  • Contracts and interconnections on semiconductors / J.E.E. Baglin, H.B. Harrison, J.L. Tandon [and others].

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