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Fine line lithography /
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; New York : New York :
North-Holland Pub. Co. ; Sole distributor for the USA and Canada, Elsevier North-Holland,
1980.
|
| Colección: | Materials processing, theory and practices ;
v. 1. |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
Tabla de Contenidos:
- Front Cover; Fine Line Lithography; Copyright Page; Introduction to the series; Preface to volume 1; Advisory board; Table of Contents; Chapter 1. Fundamentals of electron and X-ray lithography; 1. Introduction; 2. Radiation-sensitive resists; 3. Electron scattering; 4. Electron-beam lithography; 5. X-ray lithography; Acknowledgements; References; Chapter 2. Optical methods for fine line lithography; 1. Contact and proximity printing; 2. Projection printing; 3. Deep-UV lithography; 4. Special techniques; 5. Conclusion; Acknowledgements; References
- Chapter 3. Electron beam projection techniques1. Introduction, projection systems, general aspects; 2. (1:1) electron image projection systems; 3. Shadow printing with electrons and ions; 4. Demagnifying electron beam projection systems; 5. Demagnifying electron beam projection systems with photocathodes; 6. Critique and outlook; Acknowledgements; References; Chapter 4. Dry processing methods; 1. Introduction; 2. Reactive plasma etching; 3. Ion beam etching; 4. Lift-off techniques; 5. Summary; Acknowledgements; References
- Chapter 5. Application of electron beam technology to large scale integrated circuits1. Introduction; 2. Types of systems; 3. Factors affecting system performance; 4. Actual systems; 5. Summary; References; Subject index