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Fine line lithography /
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; New York : New York :
North-Holland Pub. Co. ; Sole distributor for the USA and Canada, Elsevier North-Holland,
1980.
|
| Colección: | Materials processing, theory and practices ;
v. 1. |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
MARC
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| 001 | SCIDIR_ocn609869508 | ||
| 003 | OCoLC | ||
| 005 | 20231117033102.0 | ||
| 006 | m o d | ||
| 007 | cr bn||||||abp | ||
| 007 | cr bn||||||ada | ||
| 008 | 100427s1980 ne ob 001 0 eng d | ||
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| 019 | |a 842885960 |a 842919946 |a 1162103023 | ||
| 020 | |a 9780444853516 |q (electronic bk.) | ||
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| 020 | |a 1299537200 |q (ebk) | ||
| 020 | |a 9781299537200 |q (ebk) | ||
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| 042 | |a dlr | ||
| 050 | 4 | |a TK7874 |b .F56 | |
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| 072 | 7 | |a TEC |x 008070 |2 bisacsh | |
| 082 | 0 | 4 | |a 621.381/73 |
| 084 | |a ZN 4170 |2 rvk | ||
| 084 | |a ELT 285f |2 stub | ||
| 245 | 0 | 0 | |a Fine line lithography / |c edited by Roger Newman. |
| 260 | |a Amsterdam ; |a New York : |b North-Holland Pub. Co. ; |a New York : |b Sole distributor for the USA and Canada, Elsevier North-Holland, |c 1980. | ||
| 300 | |a 1 online resource (vii, 481 pages) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials processing, theory and practices ; |v v. 1 | |
| 504 | |a Includes bibliographical references and index. | ||
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a Front Cover; Fine Line Lithography; Copyright Page; Introduction to the series; Preface to volume 1; Advisory board; Table of Contents; Chapter 1. Fundamentals of electron and X-ray lithography; 1. Introduction; 2. Radiation-sensitive resists; 3. Electron scattering; 4. Electron-beam lithography; 5. X-ray lithography; Acknowledgements; References; Chapter 2. Optical methods for fine line lithography; 1. Contact and proximity printing; 2. Projection printing; 3. Deep-UV lithography; 4. Special techniques; 5. Conclusion; Acknowledgements; References | |
| 505 | 8 | |a Chapter 3. Electron beam projection techniques1. Introduction, projection systems, general aspects; 2. (1:1) electron image projection systems; 3. Shadow printing with electrons and ions; 4. Demagnifying electron beam projection systems; 5. Demagnifying electron beam projection systems with photocathodes; 6. Critique and outlook; Acknowledgements; References; Chapter 4. Dry processing methods; 1. Introduction; 2. Reactive plasma etching; 3. Ion beam etching; 4. Lift-off techniques; 5. Summary; Acknowledgements; References | |
| 505 | 8 | |a Chapter 5. Application of electron beam technology to large scale integrated circuits1. Introduction; 2. Types of systems; 3. Factors affecting system performance; 4. Actual systems; 5. Summary; References; Subject index | |
| 546 | |a English. | ||
| 650 | 0 | |a Integrated circuits |x Large scale integration. | |
| 650 | 0 | |a Lithography. | |
| 650 | 6 | |a Circuits int�egr�es �a grande �echelle. |0 (CaQQLa)201-0067843 | |
| 650 | 6 | |a Lithographie. |0 (CaQQLa)201-0035863 | |
| 650 | 7 | |a lithography. |2 aat |0 (CStmoGRI)aat300053271 | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Digital. |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Microelectronics. |2 bisacsh | |
| 650 | 7 | |a Integrated circuits |x Large scale integration |2 fast |0 (OCoLC)fst00975566 | |
| 650 | 7 | |a Lithography |2 fast |0 (OCoLC)fst01000265 | |
| 650 | 7 | |a Integrierte Schaltung |2 gnd |0 (DE-588)4027242-4 | |
| 650 | 7 | |a Lithographie par faisceau d'�electrons. |2 ram | |
| 650 | 7 | |a Lithographie par rayons X. |2 ram | |
| 650 | 7 | |a Circuits int�egr�es �a grande �echelle. |2 ram | |
| 650 | 0 | 7 | |a Photolithographie (Halbleitertechnologie) |2 swd |
| 700 | 1 | |a Newman, Roger. | |
| 776 | 0 | 8 | |i Print version: |t Fine line lithography. |d Amsterdam ; New York : North-Holland Pub. Co. ; New York : Sole distributor for the USA and Canada, Elsevier North-Holland, 1980 |w (DLC) 80013154 |w (OCoLC)6194916 |
| 830 | 0 | |a Materials processing, theory and practices ; |v v. 1. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780444853516 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/0167790X |z Texto completo |