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SCIDIR_ocn596437374 |
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OCoLC |
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20231117033025.0 |
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m o d |
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100402s1963 enkad ob 100 0 eng d |
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d OCLCO
|d OCLCA
|d OCLCQ
|d OCLCF
|d OPELS
|d OCL
|d OCLCQ
|d STF
|d AU@
|d OCLCQ
|d OCLCO
|d OCLCQ
|d OCLCO
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|a 000010402533
|2 AU
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|a 300751076
|a 974615914
|a 1057938497
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|a 9781483198392
|q (electronic bk.)
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020 |
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|a 1483198391
|q (electronic bk.)
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035 |
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|a (OCoLC)596437374
|z (OCoLC)300751076
|z (OCoLC)974615914
|z (OCoLC)1057938497
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|a dlr
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4 |
|a TA406
|b .I5 1961
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082 |
0 |
4 |
|a 620.1123
|
111 |
2 |
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|a International Symposium on Photoelasticity
|d (1961 :
|c Chicago, Ill.)
|
245 |
1 |
0 |
|a Photoelasticity
|b proceedings of the international symposium held at Illinois Institute of Technology.
|c Edited by M.M. Frocht.
|
260 |
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|a Oxford,
|a New York,
|b Symposium Publications Division, Pergamon Press,
|c 1963.
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300 |
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|a 1 online resource (xxi, 294 pages)
|b illustrations, diagrams
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336 |
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|a text
|b txt
|2 rdacontent
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337 |
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|a computer
|b c
|2 rdamedia
|
338 |
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|a online resource
|b cr
|2 rdacarrier
|
504 |
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|a Includes bibliographical references.
|
506 |
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
533 |
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|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
538 |
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|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
583 |
1 |
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|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|2 pda
|5 MiAaHDL
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588 |
0 |
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|a Print version record.
|
650 |
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0 |
|a Photoelasticity
|v Congresses.
|
650 |
|
6 |
|a Photo�elasticit�e
|0 (CaQQLa)201-0250325
|v Congr�es.
|0 (CaQQLa)201-0378219
|
650 |
|
7 |
|a Photoelasticity
|2 fast
|0 (OCoLC)fst01061547
|
655 |
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2 |
|a Congress
|0 (DNLM)D016423
|
655 |
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7 |
|a proceedings (reports)
|2 aat
|0 (CStmoGRI)aatgf300027316
|
655 |
|
7 |
|a Conference papers and proceedings
|2 fast
|0 (OCoLC)fst01423772
|
655 |
|
7 |
|a Conference papers and proceedings.
|2 lcgft
|
655 |
|
7 |
|a Actes de congr�es.
|2 rvmgf
|0 (CaQQLa)RVMGF-000001049
|
700 |
1 |
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|a Frocht, Max Mark,
|d 1894-1974,
|e editor.
|
710 |
2 |
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|a Illinois Institute of Technology.
|
710 |
1 |
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|a United States.
|b Army Research Office.
|
776 |
0 |
8 |
|i Print version:
|a International Symposium on Photoelasticity (1961 : Chicago, Ill.).
|t Photoelasticity.
|d Oxford, New York, Symposium Publications Division, Pergamon Press, 1963
|w (DLC) 62022041
|w (OCoLC)1962128
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9781483198392
|z Texto completo
|