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SCIDIR_ocn570184525 |
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OCoLC |
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20231117033002.0 |
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m o d |
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cr bn||||||abp |
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100325s1988 maua ob 001 0 eng d |
| 040 |
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d OCLCO
|d OCLCA
|d OCLCF
|d OCLCQ
|d OPELS
|d OCLCQ
|d AU@
|d OCLCQ
|d OCLCO
|d OCLCQ
|d OCLCO
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| 016 |
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|2 AU
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| 019 |
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|a 297354990
|a 763103554
|a 1057943424
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| 020 |
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|a 9780123418272
|q (electronic bk.)
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| 020 |
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|a 0123418275
|q (electronic bk.)
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| 035 |
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|a (OCoLC)570184525
|z (OCoLC)297354990
|z (OCoLC)763103554
|z (OCoLC)1057943424
|
| 042 |
|
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|a dlr
|
| 050 |
|
4 |
|a TA403
|b .T74 vol. 27
|a QC176.83
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| 082 |
0 |
4 |
|a 620.1/1 s
|a 530.4/1
|2 19
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| 245 |
0 |
0 |
|a Analytical techniques for thin films /
|c edited by K.N. Tu and R. Rosenberg.
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| 260 |
|
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|a Boston :
|b Academic Press,
|c �1988.
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| 300 |
|
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|a 1 online resource (xi, 493 pages) :
|b illustrations
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| 336 |
|
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|a text
|b txt
|2 rdacontent
|
| 337 |
|
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|a computer
|b c
|2 rdamedia
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| 338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
| 490 |
1 |
|
|a Treatise on materials science and technology ;
|v v. 27
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| 504 |
|
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|a Includes bibliographical references and index.
|
| 506 |
|
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
| 533 |
|
|
|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
| 538 |
|
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|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
| 583 |
1 |
|
|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|2 pda
|5 MiAaHDL
|
| 505 |
0 |
|
|a Submicron structure and microanalysis / K.N. Tu and R. Rosenberg -- Synchrotron radiation photoemission studies of interfaces / J.H. Weaver -- Contact x-ray microscopy / R. Feder and D.M. Shinozaki -- X-ray diffraction analysis of stress and strain in thin films / A. Segmuller and M. Murakami --X-ray diffraction analysis of diffusion in thin films / M. Murakami, A. Segmuller, and K.N. Tu -- ESCA / N. Martensson -- Cross-sectional transmission electron microscopy of electronic and photonic devices / T.T. Sheng -- High resolution transmission electron microscopy of surfaces and interfaces / D. Cherns -- Scanning transmission electron microscopy / P. Batson -- Rutherford backscattering spectrometry on thin solid films / T.G. Finstad and W.K. Chu -- Atomic structure and atomic layer compositional analysis of thin solid films using time-of-flight atom-probe field ion microscopy / T.T. Tsong.
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| 588 |
0 |
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|a Print version record.
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| 650 |
|
0 |
|a Thin films
|x Technique.
|
| 650 |
|
6 |
|a Couches minces
|0 (CaQQLa)201-0035883
|x Technique.
|0 (CaQQLa)201-0377564
|
| 650 |
|
7 |
|a Thin films
|x Technique
|2 fast
|0 (OCoLC)fst01150042
|
| 650 |
|
7 |
|a Couches minces.
|2 ram
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| 650 |
|
7 |
|a Bombardement ionique
|x Applications scientifiques.
|2 ram
|
| 650 |
|
7 |
|a Faisceaux �electroniques
|x Applications scientifiques.
|2 ram
|
| 650 |
|
7 |
|a Rayons X
|x Applications scientifiques.
|2 ram
|
| 700 |
1 |
|
|a Tu, K. N.
|q (King-Ning),
|d 1937-
|
| 700 |
1 |
|
|a Rosenberg, R.
|
| 776 |
0 |
8 |
|i Print version:
|t Analytical techniques for thin films.
|d Boston : Academic Press, �1988
|w (DLC) 87018857
|w (OCoLC)16129139
|
| 830 |
|
0 |
|a Treatise on materials science and technology ;
|v v. 27.
|
| 856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780123418272
|z Texto completo
|
