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OCoLC |
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20231117032905.0 |
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m o d |
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100317s1980 nyua ob 001 0 eng d |
| 040 |
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d OPELS
|d E7B
|d OCLCQ
|d N$T
|d IDEBK
|d OCLCF
|d OCLCQ
|d UIU
|d YDXCP
|d OCLCQ
|d LEAUB
|d OCLCQ
|d OCLCO
|d S2H
|d OCLCO
|d COM
|d OCLCO
|d OCLCQ
|d OCLCO
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| 019 |
|
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|a 297419384
|a 842266401
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| 020 |
|
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|a 9780323153416
|q (electronic bk.)
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| 020 |
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|a 0323153410
|q (electronic bk.)
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| 020 |
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|z 9780121335502
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| 020 |
|
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|z 012133550X
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| 035 |
|
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|a (OCoLC)557491279
|z (OCoLC)297419384
|z (OCoLC)842266401
|
| 042 |
|
|
|a dlr
|
| 050 |
|
4 |
|a TK7874
|
| 072 |
|
7 |
|a TEC
|x 008060
|2 bisacsh
|
| 072 |
|
7 |
|a TEC
|x 008070
|2 bisacsh
|
| 082 |
0 |
4 |
|a 621.381/7
|2 19
|
| 245 |
0 |
0 |
|a Electron-beam technology in microelectronic fabrication /
|c edited by George R. Brewer ; contributors, J.P. Ballantyne [and others].
|
| 260 |
|
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|a New York :
|b Academic Press,
|c 1980.
|
| 300 |
|
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|a 1 online resource (xi, 362 pages) :
|b illustrations
|
| 336 |
|
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|a text
|b txt
|2 rdacontent
|
| 337 |
|
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|a computer
|b c
|2 rdamedia
|
| 338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 506 |
|
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|3 Use copy
|f Restrictions unspecified
|5 MiAaHDL
|2 star
|
| 533 |
|
|
|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
| 538 |
|
|
|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
| 583 |
1 |
|
|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|5 MiAaHDL
|2 pda
|
| 588 |
0 |
|
|a Print version record.
|
| 650 |
|
0 |
|a Microelectronics.
|
| 650 |
|
0 |
|a Lithography, Electron beam.
|
| 650 |
|
2 |
|a Miniaturization
|0 (DNLM)D008904
|
| 650 |
|
6 |
|a Micro�electronique.
|0 (CaQQLa)201-0035977
|
| 650 |
|
6 |
|a Lithographie par faisceau d'�electrons.
|0 (CaQQLa)201-0086589
|
| 650 |
|
7 |
|a microelectronics.
|2 aat
|0 (CStmoGRI)aat300253974
|
| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Digital.
|2 bisacsh
|
| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Microelectronics.
|2 bisacsh
|
| 650 |
|
7 |
|a Lithography, Electron beam
|2 fast
|0 (OCoLC)fst01000292
|
| 650 |
|
7 |
|a Microelectronics
|2 fast
|0 (OCoLC)fst01019757
|
| 650 |
|
7 |
|a Elektronenstrahllithografie
|2 gnd
|0 (DE-588)4151897-4
|
| 650 |
|
7 |
|a Mikroelektronik
|2 gnd
|0 (DE-588)4039207-7
|
| 700 |
1 |
|
|a Brewer, George Raymond,
|d 1922-
|
| 700 |
1 |
|
|a Ballantyne, J. P.
|
| 776 |
0 |
8 |
|i Print version:
|t Electron-beam technology in microelectronic fabrication.
|d New York : Academic Press, 1980
|w (DLC) 79008856
|w (OCoLC)6223500
|
| 856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780121335502
|z Texto completo
|
