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100311t19911991enka ob 001 0 eng d |
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|z 91000322
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|a OCLCE
|b eng
|e pn
|c OCLCE
|d OCLCQ
|d UIU
|d OCLCF
|d N$T
|d E7B
|d IDEBK
|d YDXCP
|d EBLCP
|d DEBSZ
|d OCLCQ
|d MERUC
|d OCLCQ
|d DEBBG
|d CUS
|d OCLCQ
|d UKAHL
|d OCLCQ
|d LUN
|d OCLCQ
|d INARC
|d OCLCO
|d OCLCQ
|d OCLCO
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| 019 |
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|a 608613890
|a 923624443
|a 974616860
|a 1100958648
|a 1285844628
|a 1302558340
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| 020 |
|
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|a 9781483103334
|q (electronic bk.)
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| 020 |
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|a 1483103331
|q (electronic bk.)
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| 020 |
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|z 0750611456
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| 020 |
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|z 9780750611459
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| 035 |
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|a (OCoLC)551318962
|z (OCoLC)608613890
|z (OCoLC)923624443
|z (OCoLC)974616860
|z (OCoLC)1100958648
|z (OCoLC)1285844628
|z (OCoLC)1302558340
|
| 042 |
|
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|a dlr
|
| 050 |
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4 |
|a TJ940
|b .H83 1991
|
| 072 |
|
7 |
|a TEC
|x 009070
|2 bisacsh
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| 082 |
0 |
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|a 621.5/5
|2 20
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| 084 |
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|a 52.99
|2 bcl
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| 100 |
1 |
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|a Hucknall, D. J.,
|e author.
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| 245 |
1 |
0 |
|a Vacuum technology and applications /
|c David J. Hucknall.
|
| 264 |
|
1 |
|a Oxford ;
|a Boston :
|b Butterworth-Heinemann,
|c 1991.
|
| 264 |
|
4 |
|c �1991
|
| 300 |
|
|
|a 1 online resource (vii, 319 pages) :
|b illustrations
|
| 336 |
|
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|a text
|b txt
|2 rdacontent
|
| 337 |
|
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|a computer
|b c
|2 rdamedia
|
| 338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
| 504 |
|
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|a Includes bibliographical references and index.
|
| 506 |
|
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|3 Use copy
|f Restrictions unspecified
|5 MiAaHDL
|2 star
|
| 533 |
|
|
|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
| 538 |
|
|
|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
| 583 |
1 |
|
|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|5 MiAaHDL
|2 pda
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| 588 |
0 |
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|a Print version record.
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| 505 |
0 |
|
|a Front Cover -- Vacuum Technology and Applications -- Copyright Page -- Table of Contents -- Preface -- Acknowledgments -- Chapter 1. Introduction -- 1.1 General -- 1.2 The gaseous state -- 1.3 Gas flow -- 1.4 Vacuum system characteristics -- References -- Chapter 2. Vacuum pumps (rough�a�?medium range) -- 2.1 General introduction -- 2.2 Rotary pumps -- 2.3 Roots vacuum pumps -- 2.4 Dry vacuum pumps -- References -- Chapter 3. Vacuum pumps (high�a�?ultra-high range) -- 3�A�1 General introduction -- 3.2 Gas transfer pumps -- 3.3 Entrapment pumps
|
| 505 |
8 |
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|a 7.2 Vacuum technology in the semiconductor industry7.3 Vacuum technology in metallurgical processes -- 7.4 Vacuum technology in the chemical industry -- References -- Chapter 8. Appendix: units, conversion factors and other data -- 8.1 Units of pressure -- 8.2 Amount of substance -- 8.3 PNEUROP specifications for the characterization of vacuum pumps -- Index
|
| 650 |
|
0 |
|a Vacuum technology.
|
| 650 |
|
6 |
|a Vide (Technologie)
|0 (CaQQLa)201-0019001
|
| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Mechanical.
|2 bisacsh
|
| 650 |
|
7 |
|a Vacuum technology
|2 fast
|0 (OCoLC)fst01163626
|
| 650 |
1 |
7 |
|a Vacu�umtechniek.
|2 gtt
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| 653 |
0 |
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|a Vacuum technology
|
| 776 |
0 |
8 |
|i Print version:
|a Hucknall, D.J.
|t Vacuum technology and applications.
|d Oxford ; Boston : Butterworth-Heinemann, 1991
|w (DLC) 91000322
|w (OCoLC)23143895
|
| 856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780750611459
|z Texto completo
|
