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Nanolithography and patterning techniques in microelectronics /

Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100 nm less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using na...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Bucknall, David G.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Cambridge : Boca Raton, FL : Woodhead Pub. ; CRC Press, �2005.
Colección:Woodhead Publishing in materials.
Temas:
Acceso en línea:Texto completo

MARC

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245 0 0 |a Nanolithography and patterning techniques in microelectronics /  |c edited by David G. Bucknall. 
260 |a Cambridge :  |b Woodhead Pub. ;  |a Boca Raton, FL :  |b CRC Press,  |c �2005. 
300 |a 1 online resource (xiv, 409 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
347 |a data file  |2 rda 
490 1 |a Woodhead Publishing in materials 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Prelium; Contents; Block copolymer nanolithography; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Chemomechanical surface modification of materials for patterning; Patterning of polymer thin films; Ion beam patterning; Nanofabrication by shadow deposition through nanostencils; Photolithography beyond the diffraction limit; Ink-jet printing as a tool in manufacturing and instrumentation; Actuators and patterns for microfluidic control; Manipulation of biomolecules and reactions. 
520 |a Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100 nm less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using nanolithography scientists can drive patterning currents through surfaces while building a 3D structure from a series of patterned layers. Electron induced chemical lithography can create ultra-high resolution templates for the site selective immobilisation of molecules, to form functional, hierarchic. 
506 |a Online access available only to subscribers. 
546 |a English. 
650 0 |a Microlithography. 
650 0 |a Nanotechnology. 
650 6 |a Microlithographie.  |0 (CaQQLa)201-0141616 
650 6 |a Nanotechnologie.  |0 (CaQQLa)201-0225435 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Circuits  |x General.  |2 bisacsh 
650 7 |a Microlithography  |2 fast  |0 (OCoLC)fst01019883 
650 7 |a Nanotechnology  |2 fast  |0 (OCoLC)fst01032639 
650 7 |a Electrical Engineering.  |2 hilcc 
650 7 |a Electrical & Computer Engineering.  |2 hilcc 
650 7 |a Engineering & Applied Sciences.  |2 hilcc 
650 7 |a Nanotecnologia.  |2 larpcal 
700 1 |a Bucknall, David G. 
776 0 8 |i Print version:  |t Nanolithography and patterning techniques in microelectronics.  |d Cambridge : Woodhead Pub. ; Boca Raton, FL : CRC Press, �2005  |z 1855739313  |w (DLC) 2006365086  |w (OCoLC)65821690 
830 0 |a Woodhead Publishing in materials. 
856 4 0 |u https://sciencedirect.uam.elogim.com/science/book/9781855739314  |z Texto completo