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Handbook of silicon wafer cleaning technology /
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Norwich, NY :
William Andrew,
�2008.
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| Edición: | 2nd ed. |
| Colección: | Materials science and process technology series.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Part 1: Introduction and Overview
- Overview and Evolution of Silicon Wafer Cleaning Technology
- Overview of Wafer Contamination and Defectivity
- Part 2: Wet-Chemical Processes
- Particle Deposition and Adhesion
- Aqueous Cleaning and Surface Conditioning Processes
- Part 3: Dry Cleaning Processes
- Gas-phase Wafer Cleaning Technology
- Plasma Stripping and Cleaning
- Cryogenic Aerosols and Supercritical Fluid Cleaning
- Part 4: Analytical and Control Aspects
- Detection and Measurement of Particulate Contaminants
- Surface Chemical Composition and Morphology
- Ultratrace Impurity and Surface Morphology Analysis
- Analysis and Control of Electrically Active Contaminants
- Part 5: Directions for the Near Future.