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High speed heterostructure devices /

Volume 41 includes an in-depth review of the most important, high-speed switches made with heterojunction technology. This volume is aimed at the graduate student or working researcher who needs a broad overview andan introduction to current literature. Key Features * The first complete review of In...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Kiehl, Richard A., Sollner, T. C. L. Gerhard
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boston : Academic Press, �1994.
Colección:Semiconductors and semimetals ; v. 41.
Temas:
Acceso en línea:Texto completo
Texto completo

MARC

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245 0 0 |a High speed heterostructure devices /  |c volume editors, Richard A. Kiehl, T.C.L. Gerhard Sollner. 
260 |a Boston :  |b Academic Press,  |c �1994. 
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490 1 |a Semiconductors and semimetals ;  |v v. 41 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
520 |a Volume 41 includes an in-depth review of the most important, high-speed switches made with heterojunction technology. This volume is aimed at the graduate student or working researcher who needs a broad overview andan introduction to current literature. Key Features * The first complete review of InP-based HFETs and complementary HFETs, which promise very low power and high speed * Offers a complete, three-chapter review of resonant tunneling * Provides an emphasis on circuits as well as devices. 
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533 |a Electronic reproduction.  |b [Place of publication not identified] :  |c HathiTrust Digital Library,  |d 2010.  |5 MiAaHDL 
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505 0 |a Front Cover; High Speed Heterostructure Devices; Copyright Page; Contents; List of Contributors; Preface; Chapter 1. Quantum Electron Devices: Physics and Applications; I. Introduction; II. Resontant-Tunneling Diodes; III. Resonant Tunneling Bipolar Transistors (RTBTs) with Double Barrier in the Base; IV. Devices with Multiple-Peak I-V Characteristics and Multiple-State RTBTs; V. Circuit Applications; VI. Unipolar Resonant Tunneling Transistors; VII. Superlattice Transport and Quantum Reflections; VIII. Field-Induced Localization in Vertical and Parallel Transport; Acknowledgments; References. 
505 8 |a Chapter 2. GaAs-Gate Semiconductor-Insulator-Semiconductor FETI. Introduction-Basic Principles; II. History and Development of SISFETs and Related Devices; III. SIS Capacitors; IV. Design of Vertical Structure; V. Processing Issues; VI. FET Characteristics; VII. SISFET Modeling; VIII. Circuit Results; IX. Discussion and Future Perspective; Acknowledgments; References; Chapter 3. Unipolar InP-Based Transistors; I. Introduction; II. Growth of InP-Based Structures; III. InP Field Effect Transistors (FETs); IV. High Electron Mobility Transistors (HEMTs); V. Summary; VI. Acknowledgments. 
505 8 |a v. Nonequilibrium Electron Transport in HBTsVI. Device Characteristics and Limiting Factors; VII. Implementation of HBTs in Integrated Circuits; VIII. Summary and Prospects; References; Chapter 6. High-Frequency Resonant-Tunneling Devices; I. Introduction; II. Times in Resonant Tunneling; III. High-Frequency Applications; IV. Future Expectations; Acknowledgments; References; List of Variables; Chapter 7. Resonant-Tunneling Hot-Electron Transistors and Circuits; I. Introduction; II. Hot Electron Transport in RHETs; III. RHET dc and Microwave Characteristics; IV. RHET Circuit Applications. 
505 8 |a v. RHET Room-Temperature OperationVI. Summary; Acknowledgment; References; Index; Contents of Volumes in This Series. 
506 1 |a Legal Deposit;  |c Only available on premises controlled by the deposit library and to one user at any one time;  |e The Legal Deposit Libraries (Non-Print Works) Regulations (UK).  |5 WlAbNL 
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