Silicon epitaxy /

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landm...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Crippa, Danilo, Rode, Daniel L., Masi, Maurizio
Formato: Electrónico eBook
Idioma:Inglés
Publicado: San Diego : Academic Press, �2001.
Colección:Semiconductors and semimetals ; v. 72.
Temas:
Semiconductors > Design and construction.
Silicon crystals > Growth.
Epitaxy.
Silicium cristallis�e > Croissance.
�Epitaxie.
SCIENCE > Physics > Electricity.
Acceso en línea:Texto completo
Texto completo
Texto completo
Tabla de Contenidos:
  • 1: CVD Technologies for Silicon: A Quick Survey
  • 2: Epitaxial Growth Theory: Vapor-Phase Chemistry and Doping
  • 3: Epitaxial Growth Facilities, Equipment, and Supplies
  • 4: Epitaxial Growth Techniques
  • 5: Epitaxial Growth Techniques: Molecular Beam Epitaxy
  • 6: Epitaxial Growth Modeling
  • 7: Epitaxial Layer Characterization and Metrology
  • 8: Epitaxy for Discretes and Power Devices
  • 9: Epitaxy on Patterned Wafers
  • 10: Si-Based Alloys: SiGe and SiGe:C
  • 11: Silicon Epitaxy: New Applications.

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