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Principles of physical vapor deposition of thin films /
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; Boston ; London :
Elsevier,
2006.
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| Edición: | 1st ed. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Introduction
- Evaporation
- Plasma state
- Cold plasma discharges
- Thermal evaporation sources
- Gas glow in thin film processing systems
- Special sources
- Gas solid interactions
- Nucleation and growth of films
- Epitaxy
- Substrate preparation
- Structure and properties of films
- Dry etching.