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Principles of physical vapor deposition of thin films /

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...

Descripción completa

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: SreeHarsha, K. S.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Amsterdam ; Boston ; London : Elsevier, 2006.
Edición:1st ed.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. Offers detailed derivation of important formulae. Thoroughly covers the basic principles of materials science that are important to any thin film preparation. Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Descripción Física:1 online resource (xi, 1160 pages) : illustrations
Bibliografía:Includes bibliographical references and index.
ISBN:9780080446998
008044699X
9780080480312
0080480314
1281052248
9781281052247
9786611052249
6611052240