Diamond films : chemical vapor deposition for oriented and heteroepitaxial growth /

<Li>Discusses the most advanced techniques for diamond growth</li> <li>Assists diamond researchers in deciding on the most suitable process conditions</li> <li>Inspires readers to devise new CVD (chemical vapor deposition</li> Ever since the early 1980s, and the d...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Kobashi, Koji
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Amsterdam : London : Elsevier, 2005.
Edición:1st ed.
Temas:
Diamonds, Artificial.
Diamond thin films.
Diamants artificiels.
Couches minces de diamant.
TECHNOLOGY & ENGINEERING > Chemical & Biochemical.
Diamond thin films
Diamonds, Artificial
Acceso en línea:Texto completo
Tabla de Contenidos:
  • 1. Overview of Oriented Growth
  • 2. Diamond
  • Structure and CVD Growth
  • 3. Microwave Plasma CVD Reactors
  • 4. Other CVD Reactors
  • 5. Crystal Orientations and Film Surface Morphology
  • 6. Formation of Twins
  • 7. Homoepitaxial Growth
  • 8. Surface Reconstruction
  • 9. Epitaxial Growth on cBN, Ni, and Other Substrates
  • 10. Diamond Nucleation
  • 11. HOD Film Growth
  • 12. Oriented Growth on Noble Metals
  • 13. Properties and Applications of Heteroepitaxial Diamond Films
  • 14. Conclusion
  • APPENDICES
  • Notations and units
  • Plasma
  • Properties of diamond and other semiconducting materials
  • Reconstruction of diamond surfaces
  • Materials constants
  • Phase diagrams of carbon and metals
  • Carbon solubilities in metals
  • Biasing and growth conditions for diamond growth.

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