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Novel materials processing by advanced electromagnetic energy sources (MAPEES'04) : proceedings of the International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources : March 19-22, 2004, Osaka, Japan /
Proceedings of the International Symposium in Novel Materials Processing by Advanced Electromagnetic Energy Sources (MAPEES'04) *Identifies and details recent progress achieved by advanced electromagnetic energy sources in materials processing. *Explores novel approaches to advanced electromagn...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor Corporativo: | |
| Otros Autores: | |
| Formato: | Electrónico Congresos, conferencias eBook |
| Idioma: | Inglés |
| Publicado: |
Amsterdam ; Boston :
Elsevier,
2005.
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| Edición: | 1st ed. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Cover
- CONTENTS
- Preface
- Organizing Committee
- Plenary Papers
- Smart Processing Development of Novel Materials for Electromagnetic Wave Control
- A Review of Cluster Ion Beam Process Technology
- Plasma Processing
- Structural Control of Nanocarbon Materials by Novel Plasma Processing (Invited)
- Amorphous Carbon Film Deposition by Magnetically-Driven Shunting Arc Discharge (Invited)
- RF Sheet-Plasma Source Using Permanent Magnets
- Deposition Uniformity of Pulsed Vacuum Arc Ion Source
- Thermal Properties of Gravity-Free Gas-Arc Discharge Measured in a Jet Plane and Its Application Nano-Tube Production
- New Method for Measuring Ion Energy in Pulsed Vacuum Arc
- Relationship between H-/D- Production and Plasma Parameter Control with Magnetic Filter in Volume Negative Ion Sources
- Novel Method to Increase Energy Density of Arc Plasma Jet
- Material Coating Using Electromagnetically Accelerated Plasma Jet
- Process Control of Carbon Nanotube Formation Using RF Glow-Discharge Plasma in Strong Magnetic Field
- Development of Arc Discharge Method in Organic Solvents for the Formation of DNA Encapsulated Carbon Nanotubes
- Effects of Sputtering Due to Ion Irradiation on Plasma Anisotropic CVD of Cu
- Evaluation of Contribution of Higher-Order Silane Radicals in Silane Discharges to Si-H2 Bond Formation in A-Si:H Films
- Nanometer-Ranged Metallic Coatings by Noble Pulsed Cathodic Arc Deposition
- Preparation of Hard Carbon Films by MCECR Plasma Sputtering Method
- Microwave/Millimeter-Wave Processing
- Micro- and Millimeter-Wave Processing of Advanced Materials at Karlsruhe Research Center (Invited)
- Simultaneous Use of Different High Frequency Energy Sources for Material Processing (Invited)
- High Power Submillimeter Wave Radiation Sources, Gyrotron FU Series (Invited)
- What Type of Transport Phenomena can be Induced by Microwave Field in Solids and How These Phenomena Contribute to Materials Processing (Invited)
- Powerful Electron Beams for Cyclotron Resonance Devices
- Quasi-Stationary Electro-Thermal Heating Model for Microwave/Hybrid-Processed Materials Using Greens Function Techniques
- Aerospace CFRP Structure Fabrication with the 2.45 GHz Hephaistos System
- Optimization of Slotted Waveguides for 2.45 GHz Applicators Using Nobel Slot Types
- The Role of High Pressure Plasma in Microwave Sintering Processes
- Heating Behavior of Slags in 2.45 GHz Microwave Applicator
- Rapid Heating by Single-Mode Cavity Controlled at 6 GHz
- Millimeter-Wave Dielectric Measurement of SiC Powders as a Basis of Millimeter-Wave Sintering of Ceramics
- Boron Carbide Ceramics Sintering by Using 24 GHz Compact Gyrotron
- Instrumented Millimeter Wave Sintering of Mechanically Alloyed Amorphous Ceramic Powders for Bulk Nanocrystalline Synthesis
- Millimeter-Wave Effect on Sintering of Silicon Nitrides by 28 GHz Millimeter-Wave Radiation
- Mechanical Evaluation for Silicon Nitride Sintered by 28 GHz Millimeter-Wave Heating
- Intergranular Microstructure of Yb2O3-added AIN Sintered by Millimeter-Wave Heating
- Laser Processing
- All Solid State High Power Lasers for Materials Processing (Invited)
- Effect of Surface Orientation on Characteristic Weld Microstructure Evolution of Ni-Base Superalloy.