Cargando…
PVD for microelectronics : sputter deposition applied to semiconductor manufacturing /
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the dev...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
San Diego :
Academic Press,
�1999.
|
| Colección: | Thin films (San Diego, Calif.) ;
v. 26. |
| Temas: | |
| Acceso en línea: | Texto completo Texto completo |
MARC
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | SCIDIR_ocn162128950 | ||
| 003 | OCoLC | ||
| 005 | 20231117014745.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 070802s1999 caua ob 001 0 eng d | ||
| 040 | |a OPELS |b eng |e pn |c OPELS |d OPELS |d OCLCQ |d OCLCF |d OCLCO |d N$T |d YDXCP |d IDEBK |d E7B |d OCLCQ |d DEBSZ |d STF |d D6H |d OCLCQ |d LEAUB |d OL$ |d VLY |d OCLCQ |d OCLCO |d COM |d OCLCO |d OCLCQ |d OCLCO | ||
| 019 | |a 175280590 |a 648327571 |a 1035655361 |a 1162319317 | ||
| 020 | |a 9780125330268 | ||
| 020 | |a 012533026X | ||
| 020 | |a 9780080542928 | ||
| 020 | |a 0080542921 | ||
| 020 | |a 1281054887 | ||
| 020 | |a 9781281054883 | ||
| 020 | |a 9786611054885 | ||
| 020 | |a 661105488X | ||
| 035 | |a (OCoLC)162128950 |z (OCoLC)175280590 |z (OCoLC)648327571 |z (OCoLC)1035655361 |z (OCoLC)1162319317 | ||
| 050 | 4 | |a TK7872.T55 |b P68 1999eb | |
| 072 | 7 | |a TEC |x 008100 |2 bisacsh | |
| 072 | 7 | |a TEC |x 008090 |2 bisacsh | |
| 082 | 0 | 4 | |a 621.3815/2 |2 22 |
| 100 | 1 | |a Powell, Ronald A. | |
| 245 | 1 | 0 | |a PVD for microelectronics : |b sputter deposition applied to semiconductor manufacturing / |c Ronald A. Powell, Stephen M. Rossnagel. |
| 260 | |a San Diego : |b Academic Press, |c �1999. | ||
| 300 | |a 1 online resource (xiii, 419 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Thin films ; |v v. 26 | |
| 520 | |a GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts. | ||
| 505 | 0 | |a Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index. | |
| 504 | |a Includes bibliographical references and indexes. | ||
| 588 | 0 | |a Print version record. | |
| 546 | |a English. | ||
| 650 | 0 | |a Thin film devices |x Design and construction. | |
| 650 | 0 | |a Vapor-plating. | |
| 650 | 0 | |a Thin films. | |
| 650 | 6 | |a Couches minces. |0 (CaQQLa)201-0035883 | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Solid State. |2 bisacsh | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Semiconductors. |2 bisacsh | |
| 650 | 7 | |a Thin film devices |x Design and construction |2 fast |0 (OCoLC)fst01150013 | |
| 650 | 7 | |a Thin films |2 fast |0 (OCoLC)fst01150018 | |
| 650 | 7 | |a Vapor-plating |2 fast |0 (OCoLC)fst01164135 | |
| 650 | 7 | |a F�isica geral. |2 larpcal | |
| 700 | 1 | |a Rossnagel, Stephen M. | |
| 776 | 0 | 8 | |i Print version: |a Powell, Ronald A. |t PVD for microelectronics. |d San Diego : Academic Press, �1999 |z 012533026X |z 9780125330268 |w (DLC) 98028495 |w (OCoLC)39275876 |
| 830 | 0 | |a Thin films (San Diego, Calif.) ; |v v. 26. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780125330268 |z Texto completo |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/bookseries/10794050/26 |z Texto completo |