Ionized physical vapor deposition /

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet th...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Hopwood, Jeffrey A.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: San Diego : Academic Press, �2000.
Colección:Thin films (San Diego, Calif.) ; v. 27.
Temas:
Thin film devices > Design and construction.
Physical vapor deposition.
Thin films.
D�ep�ot physique en phase vapeur.
Couches minces.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
Physical vapor deposition
Thin film devices > Design and construction
Thin films
Acceso en línea:Texto completo
Texto completo
Tabla de Contenidos:
  • The role of ionized physical vapor deposition in integrated circuit fabrication / Jeffrey A. Hopwood
  • High-density plasma sources / Amy E. Wendt
  • Ionization by radio freguency inductively coupled plasma / Steve Rossnagel
  • Ionization by microwave electron cyclotron resonance plasma / William M. Holber
  • Ionized hollow cathode magnetron sputtering / Kwok F. Lai
  • Applications and properties of ionized physical vapor deposition films / John Forster
  • Plasma physics / Jeffrey A. Hopwood
  • Numerical modeling / Ming Li, Michael A. Vyvoda, and David B. Graves.

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