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Characterization in silicon processing /

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Strausser, Yale
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boston : Greenwich : Butterworth-Heinemann ; Manning, �1993.
Colección:Materials characterization series.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Descripción Física:1 online resource (xiii, 240 pages) : illustrations
Bibliografía:Includes bibliographical references and index.
ISBN:1591245257
9781591245254
9780080523422
0080523420