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High density plasma sources : design, physics, and performance /
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Park Ridge, N.J. :
Noyes Publications,
�1995.
|
| Colección: | Materials science and process technology series. Electronic materials and process technology.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 050 | 4 | |a QC718.5.D4 |b H54 1995eb | |
| 072 | 7 | |a TEC |x 009070 |2 bisacsh | |
| 082 | 0 | 4 | |a 530.4/42 |2 22 |
| 245 | 0 | 0 | |a High density plasma sources : |b design, physics, and performance / |c edited by Oleg A. Popov. |
| 260 | |a Park Ridge, N.J. : |b Noyes Publications, |c �1995. | ||
| 300 | |a 1 online resource (xx, 445 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials science and process technology series. Electronic materials and process technology | |
| 504 | |a Includes bibliographical references and index. | ||
| 520 | 2 | |a This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. | |
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a Helicon Plasma Sources -- Planar Inductive Sources -- Electrostatically-Shielded Inductively-Coupled RF Plasma Sources -- Very High Frequency Capacitive Plasma Sources -- Surface Wave Plasma Sources -- Microwave Plasma Disk Processing Machines -- Electron Cyclotron Resonance Plasma Sources -- Distributed ECR Plasma Sources -- References -- Index. | |
| 546 | |a English. | ||
| 650 | 0 | |a Plasma density. | |
| 650 | 0 | |a High temperature plasmas. | |
| 650 | 0 | |a Plasma generators. | |
| 650 | 6 | |a Plasma (Gaz ionis�es) |x Densit�e. |0 (CaQQLa)201-0042710 | |
| 650 | 6 | |a Plasmas chauds. |0 (CaQQLa)201-0059243 | |
| 650 | 6 | |a G�en�erateurs de plasma. |0 (CaQQLa)201-0102637 | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Mechanical. |2 bisacsh | |
| 650 | 7 | |a High temperature plasmas |2 fast |0 (OCoLC)fst00956478 | |
| 650 | 7 | |a Plasma density |2 fast |0 (OCoLC)fst01066303 | |
| 650 | 7 | |a Plasma generators |2 fast |0 (OCoLC)fst01066333 | |
| 700 | 1 | |a Popov, Oleg A. | |
| 776 | 0 | 8 | |i Print version: |t High density plasma sources. |d Park Ridge, N.J. : Noyes Publications, �1995 |z 0815513771 |w (DLC) 95004918 |w (OCoLC)32666280 |
| 830 | 0 | |a Materials science and process technology series. |p Electronic materials and process technology. | |
| 856 | 4 | 0 | |u https://sciencedirect.uam.elogim.com/science/book/9780815513773 |z Texto completo |