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|a dlr
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4 |
|a TP873.5.D5
|b L58 1995eb
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|x 009010
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1 |
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|a Liu, Huimin,
|d 1961-
|
245 |
1 |
0 |
|a Diamond chemical vapor deposition :
|b nucleation and early growth stages /
|c by Huimin Liu and David S. Dandy.
|
260 |
|
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|a Park Ridge, N.J. :
|b Noyes Publications,
|c �1995.
|
300 |
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|a 1 online resource (xi, 195 pages) :
|b illustrations
|
336 |
|
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|a text
|b txt
|2 rdacontent
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337 |
|
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|a computer
|b c
|2 rdamedia
|
338 |
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|a online resource
|b cr
|2 rdacarrier
|
490 |
1 |
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|a Materials science and process technology series. Electronic materials and process technology
|
520 |
|
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|a This book presents a systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists, and engineers in academics and industry with the latest developments in this growing field.
|
504 |
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|a Includes bibliographical references and index.
|
505 |
0 |
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|a General Introduction -- Atomic and Crystal Structures of Diamond -- Diamond CVD Techniques -- Diamond Nucleation Mechanisms -- Effects of Surface Conditions on Diamond Nucleation -- Effects of Deposition Conditions on Diamond Nucleation -- Theoretical and Modeling Studies on Diamond Nucleation -- References -- Index.
|
506 |
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
533 |
|
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|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
538 |
|
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|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
583 |
1 |
|
|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|2 pda
|5 MiAaHDL
|
588 |
0 |
|
|a Print version record.
|
506 |
|
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|a Access restricted to Ryerson students, faculty and staff.
|5 CaOTR
|
650 |
|
0 |
|a Chemical vapor deposition.
|
650 |
|
0 |
|a Diamonds, Artificial.
|
650 |
|
6 |
|a D�ep�ot chimique en phase vapeur.
|0 (CaQQLa)201-0258602
|
650 |
|
6 |
|a Diamants artificiels.
|0 (CaQQLa)201-0020016
|
650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Chemical & Biochemical.
|2 bisacsh
|
650 |
|
7 |
|a Chemical vapor deposition
|2 fast
|0 (OCoLC)fst00853229
|
650 |
|
7 |
|a Diamonds, Artificial
|2 fast
|0 (OCoLC)fst00892608
|
650 |
|
7 |
|a CVD-Verfahren
|2 gnd
|0 (DE-588)4009846-1
|
650 |
|
7 |
|a Diamant
|2 gnd
|0 (DE-588)4012069-7
|
700 |
1 |
|
|a Dandy, David S.
|
776 |
0 |
8 |
|i Print version:
|a Liu, Huimin, 1961-
|t Diamond chemical vapor deposition.
|d Park Ridge, N.J. : Noyes Publications, �1995
|z 0815513801
|w (DLC) 95030332
|w (OCoLC)32698652
|
830 |
|
0 |
|a Materials science and process technology series.
|p Electronic materials and process technology.
|
856 |
4 |
0 |
|u https://sciencedirect.uam.elogim.com/science/book/9780815513803
|z Texto completo
|