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Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications /
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Norwich, N.Y. :
Noyes Publications/William Andrew Pub.,
�2002.
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| Edición: | 2nd ed. |
| Colección: | Materials science and process technology series. Electronic materials and process technology.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Foreword: Gordon Moore
- Recent Changes in the Semiconductor Industry
- Deposition Technologies and Applications: Introduction and Overview
- Silicon Epitaxy by Chemical Vapor Deposition
- Chemical Vapor Deposition of Silicon Dioxide Films
- Metal Organic Chemical Vapor Deposition
- Feature Scale Modeling
- The Role of Metrology and Inspection to Semiconductor Processing
- Contamination Control, Defect Detection and Yield Enhancement in Gigabit Manufacturing
- Sputtering and Sputter Deposition
- Laser and Electron Beam Assisted Processing
- Molecular Beam Epitaxy: Equipment and Practice
- Ion Beam Deposition
- Chemical Mechanical Polishing
- Organic Dielectrics in Multilevel Metallization of Integrated Circuits
- Performance, Processing, and Lithography Trends
- Index.