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Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications /

The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Seshan, Krishna
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Norwich, N.Y. : Noyes Publications/William Andrew Pub., �2002.
Edición:2nd ed.
Colección:Materials science and process technology series. Electronic materials and process technology.
Temas:
Acceso en línea:Texto completo

MARC

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245 0 0 |a Handbook of thin-film deposition processes and techniques :  |b principles, methods, equipment and applications /  |c edited by Krishna Seshan. 
250 |a 2nd ed. 
260 |a Norwich, N.Y. :  |b Noyes Publications/William Andrew Pub.,  |c �2002. 
300 |a 1 online resource (xxviii, 629 pages) :  |b illustrations. 
336 |a text  |b txt  |2 rdacontent 
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490 1 |a Materials science and process technology series. Electronic materials and process technology 
520 |a The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials. 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Foreword: Gordon Moore -- Recent Changes in the Semiconductor Industry -- Deposition Technologies and Applications: Introduction and Overview -- Silicon Epitaxy by Chemical Vapor Deposition -- Chemical Vapor Deposition of Silicon Dioxide Films -- Metal Organic Chemical Vapor Deposition -- Feature Scale Modeling -- The Role of Metrology and Inspection to Semiconductor Processing -- Contamination Control, Defect Detection and Yield Enhancement in Gigabit Manufacturing -- Sputtering and Sputter Deposition -- Laser and Electron Beam Assisted Processing -- Molecular Beam Epitaxy: Equipment and Practice -- Ion Beam Deposition -- Chemical Mechanical Polishing -- Organic Dielectrics in Multilevel Metallization of Integrated Circuits -- Performance, Processing, and Lithography Trends -- Index. 
546 |a English. 
650 0 |a Thin film devices  |x Design and construction  |v Handbooks, manuals, etc. 
650 0 |a Thin films  |v Handbooks, manuals, etc. 
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700 1 |a Seshan, Krishna. 
776 0 8 |i Print version:  |t Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications.  |d Norwich, N.Y. : Noyes Publications/William Andrew Pub., 2002  |z 0815514425  |w (DLC) 2001135178  |w (OCoLC)42960492 
830 0 |a Materials science and process technology series.  |p Electronic materials and process technology. 
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