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Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications /
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers...
| Clasificación: | Libro Electrónico |
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| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Norwich, N.Y. :
Noyes Publications/William Andrew Pub.,
�2002.
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| Edición: | 2nd ed. |
| Colección: | Materials science and process technology series. Electronic materials and process technology.
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| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials. |
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| Descripción Física: | 1 online resource (xxviii, 629 pages) : illustrations. |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 1591241936 9781591241935 9780815517788 0815517785 9780815517764 0815517769 0429076746 9780429076749 1482269686 9781482269680 1282253190 9781282253193 9786612253195 6612253193 9786612253188 6612253185 |