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|a Leach, R. K.,
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|a Fundamental principles of engineering nanometrology /
|c Richard Leach.
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|a Second edition.
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|a Oxford, OX :
|b Elsevier, William Andrew,
|c 2014.
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|a 1 online resource (384 pages)
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|a Micro & nano technologies series
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|a Print version record.
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|a Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. This new edition of Fundamental Principles of Engineering Nanometrology provides a road map and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale, from the fundamentals of precision measurement, to different measurement and characterization techniques. This book is an essential guide for the emerging nanomanufacturing and nanofabrication sectors, where measurement and standardiza.
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|a Includes bibliographical references and index.
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|a Front Cover; Fundamental Principles of Engineering Nanometrology; Copyright Page; Contents; Acknowledgements; List of Figures; List of Tables; 1 Introduction to Metrology for Advanced Manufacturing and Micro- and Nanotechnology; 1.1 What is engineering nanometrology?; 1.2 The contents of this book and differences to edition 1; References; 2 Some Basics of Measurement; 2.1 Introduction to measurement; 2.2 Units of measurement and the SI; 2.3 Length; 2.4 Mass; 2.5 Force; 2.6 Angle; 2.7 Traceability; 2.8 Accuracy, precision, resolution, error and uncertainty; 2.8.1 Accuracy and precision.
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|a 2.8.2 Resolution and error2.8.3 Uncertainty in measurement; 2.8.3.1 The propagation of probability distributions; 2.8.3.2 The GUM uncertainty framework; 2.8.3.3 A Monte Carlo method; 2.9 The laser; 2.9.1 Theory of the helium-neon laser; 2.9.2 Single-mode laser wavelength stabilisation schemes; 2.9.3 Laser frequency stabilisation using saturated absorption; 2.9.3.1 Two-mode stabilisation; 2.9.4 Zeeman-stabilised 633nm lasers; 2.9.5 Frequency calibration of a (stabilised) 633nm laser; 2.9.6 Modern and future laser frequency standards; References.
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|a 3 Precision Measurement Instrumentation -- Some Design Principles3.1 Geometrical considerations; 3.2 Kinematic design; 3.2.1 The Kelvin clamps; 3.2.2 A single degree of freedom motion device; 3.3 Dynamics; 3.4 The Abbe principle; 3.5 Elastic compression; 3.6 Force loops; 3.6.1 The structural loop; 3.6.2 The thermal loop; 3.6.3 The metrology loop; 3.7 Materials; 3.7.1 Minimising thermal inputs; 3.7.2 Minimising mechanical inputs; 3.8 Symmetry; 3.9 Vibration isolation; 3.9.1 Sources of vibration; 3.9.2 Passive vibration isolation; 3.9.3 Damping; 3.9.4 Internal resonances.
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|a 4.4.4 The Fabry-Pérot interferometer4.5 Measurement of gauge blocks by interferometry; 4.5.1 Gauge blocks and interferometry; 4.5.2 Gauge block interferometry; 4.5.3 Operation of a gauge block interferometer; 4.5.3.1 Fringe fraction measurement -- phase stepping; 4.5.3.2 Multiple wavelength interferometry analysis; 4.5.3.3 Vacuum wavelength; 4.5.3.4 Thermal effects; 4.5.3.5 Refractive index measurement; 4.5.3.6 Aperture correction; 4.5.3.7 Surface and phase change effects; 4.5.4 Sources of error in gauge block interferometry; 4.5.4.1 Fringe fraction determination uncertainty.
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|f Copyright: Elsevier Science & Technology
|g 2014
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590 |
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|a O'Reilly
|b O'Reilly Online Learning: Academic/Public Library Edition
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650 |
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|a Nanotechnology.
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|a Microtechnology.
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|a Metrology.
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|a Microtechnologie.
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|a Métrologie.
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|a TECHNOLOGY & ENGINEERING
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|a TECHNOLOGY & ENGINEERING
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|0 (OCoLC)fst01020132
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|a Nanotechnology.
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|0 (OCoLC)fst01032639
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|i Print version:
|a Leach, Richard.
|t Fundamental Principles of Engineering Nanometrology.
|b 2nd ed.
|d Burlington : Elsevier Science, 2014
|z 9781455777501
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