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Fundamental principles of engineering nanometrology /

Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. This new edition of Fundamental Principles of Engineering Nanometrology provides a road map and toolkit for metrologists engaging with the rig...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Leach, R. K. (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Oxford, OX : Elsevier, William Andrew, 2014.
Edición:Second edition.
Colección:Micro & nano technologies.
Temas:
Acceso en línea:Texto completo (Requiere registro previo con correo institucional)

MARC

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245 1 0 |a Fundamental principles of engineering nanometrology /  |c Richard Leach. 
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520 |a Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. This new edition of Fundamental Principles of Engineering Nanometrology provides a road map and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale, from the fundamentals of precision measurement, to different measurement and characterization techniques. This book is an essential guide for the emerging nanomanufacturing and nanofabrication sectors, where measurement and standardiza. 
504 |a Includes bibliographical references and index. 
505 0 |a Front Cover; Fundamental Principles of Engineering Nanometrology; Copyright Page; Contents; Acknowledgements; List of Figures; List of Tables; 1 Introduction to Metrology for Advanced Manufacturing and Micro- and Nanotechnology; 1.1 What is engineering nanometrology?; 1.2 The contents of this book and differences to edition 1; References; 2 Some Basics of Measurement; 2.1 Introduction to measurement; 2.2 Units of measurement and the SI; 2.3 Length; 2.4 Mass; 2.5 Force; 2.6 Angle; 2.7 Traceability; 2.8 Accuracy, precision, resolution, error and uncertainty; 2.8.1 Accuracy and precision. 
505 8 |a 2.8.2 Resolution and error2.8.3 Uncertainty in measurement; 2.8.3.1 The propagation of probability distributions; 2.8.3.2 The GUM uncertainty framework; 2.8.3.3 A Monte Carlo method; 2.9 The laser; 2.9.1 Theory of the helium-neon laser; 2.9.2 Single-mode laser wavelength stabilisation schemes; 2.9.3 Laser frequency stabilisation using saturated absorption; 2.9.3.1 Two-mode stabilisation; 2.9.4 Zeeman-stabilised 633nm lasers; 2.9.5 Frequency calibration of a (stabilised) 633nm laser; 2.9.6 Modern and future laser frequency standards; References. 
505 8 |a 3 Precision Measurement Instrumentation -- Some Design Principles3.1 Geometrical considerations; 3.2 Kinematic design; 3.2.1 The Kelvin clamps; 3.2.2 A single degree of freedom motion device; 3.3 Dynamics; 3.4 The Abbe principle; 3.5 Elastic compression; 3.6 Force loops; 3.6.1 The structural loop; 3.6.2 The thermal loop; 3.6.3 The metrology loop; 3.7 Materials; 3.7.1 Minimising thermal inputs; 3.7.2 Minimising mechanical inputs; 3.8 Symmetry; 3.9 Vibration isolation; 3.9.1 Sources of vibration; 3.9.2 Passive vibration isolation; 3.9.3 Damping; 3.9.4 Internal resonances. 
505 8 |a 4.4.4 The Fabry-Pérot interferometer4.5 Measurement of gauge blocks by interferometry; 4.5.1 Gauge blocks and interferometry; 4.5.2 Gauge block interferometry; 4.5.3 Operation of a gauge block interferometer; 4.5.3.1 Fringe fraction measurement -- phase stepping; 4.5.3.2 Multiple wavelength interferometry analysis; 4.5.3.3 Vacuum wavelength; 4.5.3.4 Thermal effects; 4.5.3.5 Refractive index measurement; 4.5.3.6 Aperture correction; 4.5.3.7 Surface and phase change effects; 4.5.4 Sources of error in gauge block interferometry; 4.5.4.1 Fringe fraction determination uncertainty. 
542 |f Copyright: Elsevier Science & Technology  |g 2014 
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