Computational lithography /

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A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Ma, Xu, 1983-
Otros Autores: Arce, Gonzalo R.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Hoboken, N.J. : Wiley, ©2010.
Colección:Wiley series in pure and applied optics.
Temas:
Microlithography > Mathematics.
Integrated circuits > Design and construction > Mathematics.
Photolithography > Mathematics.
Semiconductors > Etching > Mathematics.
Resolution (Optics)
Microlithographie > Mathématiques.
Circuits intégrés > Conception et construction > Mathématiques.
Photolithographie > Mathématiques.
Semi-conducteurs > Attaque chimique > Mathématiques.
Résolution (Optique)
resolution (optical concept)
TECHNOLOGY & ENGINEERING > Electronics > Circuits > General.
Acceso en línea:Texto completo (Requiere registro previo con correo institucional)
Tabla de Contenidos:
  • Optical Lithography Systems
  • Rule-Based Resolution Enhancement Techniques
  • Fundamentals of Optimization
  • Computational Lithography with Coherent Illumination
  • Regularization Framework
  • Computational Lithography with Partially Coherent Illumination
  • Other RET Optimization Techniques
  • Source and Mask Optimization
  • Coherent Thick-Mask Optimization
  • Conclusions and New Directions of Computational Lithography
  • Appendix A: Formula Derivation in Chapter 5
  • Appendix B: Manhattan Geometry
  • Appendix C: Formula Derivation in Chapter 6
  • Appendix D: Formula Derivation in Chapter 7
  • Appendix E: Formula Derivation in Chapter 8
  • Appendix F: Formula Derivation in Chapter 9
  • Appendix G: Formula Derivation in Chapter 10
  • Appendix H: Software Guide.

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